Conductive member and method for producing the same
A technology of conductive parts and manufacturing methods, applied in contact parts, thin material handling, transportation and packaging, etc., can solve the problems of easy peeling, peeling, poor adhesion, etc.
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[0047] (First embodiment)
[0048] First, the first embodiment will be described. The conductive member 10 of the first embodiment is, for example, a conductive member used in a terminal of an automotive connector of an automobile, such as figure 1 As shown, the Cu-Sn intermetallic compound layer 3 and the Sn-based surface layer 4 are sequentially formed on the surface of the Cu-based substrate 1 through the Ni-based base layer 2, and the Cu-Sn intermetallic compound layer 3 is further composed of Cu 3 Sn layer 5 and Cu 6 Sn 5 Layer 6 composition.
[0049] The Cu-based substrate 1 is, for example, a plate-shaped substrate made of Cu or Cu alloy. As the Cu alloy, its material is not necessarily limited, but it is suitable for Cu-Zn alloy, Cu-Ni-Si (Coleson) alloy, Cu-Cr-Zr alloy, Cu-Mg-P alloy, For Cu-Fe-P-based alloys and Cu-Sn-P-based alloys, for example, MSP1, MZC1, MAX251C, MAX375, MAX126 manufactured by Mitsubishi Shindoh Co., Ltd. can be suitably used.
[0050] The Ni-based ba...
Example Embodiment
[0082] (Example 1)
[0083] Next, examples of the first embodiment will be described.
[0084] A MAX251C material manufactured by Mitsubishi Shindoh Co., Ltd. with a thickness of 0.25 mm was used as a Cu alloy plate (Cu-based base material), and the plating treatments of Ni, Cu, and Sn were sequentially performed on the material. At this time, as shown in Table 4, a plurality of samples were prepared by changing the current density of each plating process. Regarding the target thickness of each plating layer, the thickness of the Ni plating layer was set to 0.3 μm, the thickness of the Cu plating layer was set to 0.3 μm, and the thickness of the Sn plating layer was set to 1.5 μm. In addition, a water washing step for rinsing the plating solution from the surface of the processed material is added between the three plating steps.
[0085] In the plating process in this embodiment, a plating solution is sprayed on a Cu alloy plate at a high speed, and an insoluble anode of a Ti plat...
Example
[0106] (Second embodiment)
[0107] Then, according to Figure 7 The second embodiment will be described. At that Figure 7 Here, the same reference numerals are attached to the parts common to the first embodiment to simplify the description.
[0108] Such as Figure 7 As shown, in the conductive member 30 of the second embodiment, the Ni-based base layer 2, the Cu-Sn intermetallic compound layer 3, and the Sn-based surface layer 4 are sequentially formed on the surface of the Cu-based substrate 1 via the Fe-based base layer 31, and The Cu-Sn intermetallic compound layer 3 is further composed of Cu 3 Sn layer 5 and Cu 6 Sn 5 Layer 6 composition.
[0109] The Cu-based substrate 1 is the same as the substrate of the first embodiment.
[0110] The Fe-based base layer 31 is formed by electroplating Fe or Fe alloy, and is formed on the surface of the Cu-based base material 1 with a thickness of 0.1 to 1.0 μm. If the Fe-based base layer 31 is a small amount of less than 0.1 μm, the Cu...
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