Method for producing quasi-single crystal silicon with casting method and stabilizing crystal seed at furnace bottom after melting in ingot furnace
A casting method and silicon ingot furnace technology, applied in the field of crystal growth, can solve the problems of floating on the silicon melt, process failure, and inability to grow single crystals, etc., and achieve the effect of reducing the height of the seed crystal and reducing the cost
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[0022] The casting method is similar to the method in which the seed crystal is stabilized at the bottom of the furnace after melting in a monocrystalline silicon ingot furnace. It is characterized in that: in a GT polycrystalline ingot furnace or a four-sided heater plus a top heater:
[0023] a. During the heating and melting process of the ingot furnace, when TC1 reaches 1420-1600 degrees Celsius, keep TC1 stable, and control TC2 at 1200-1350 degrees Celsius by opening the heat insulation cage, and the control time of TC2 is 20-500 minutes;
[0024] Specifically, the following choices can also be made: by opening the heat insulation cage, control TC2 at 1200-1220 degrees Celsius, or 1220-1340 degrees Celsius, or 1240-1260 degrees Celsius, or 1260-1280 degrees Celsius, or 1280-1300 degrees Celsius, or 1300-1320 degrees Celsius Celsius, or 1320-1350 Celsius; TC2 control time can be selected from 20-60 minutes, or 60-100 minutes, or 100-140 minutes, or 140-180 minutes, or 180-2...
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