Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Discharge lamp

A technology for discharge lamps and discharge capacitors, which is applied to discharge lamps, gas discharge lamps, parts of gas discharge lamps, etc., can solve the problems of difficult processing and expensive tungsten, and achieve low cost, small heat load, and high emissivity Effect

Inactive Publication Date: 2011-11-23
OSRAM GMBH
View PDF9 Cites 2 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

On the downside however, tungsten will be relatively difficult to machine and expensive

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Discharge lamp
  • Discharge lamp

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0015] With the aid of xenon short-arc lamps or mercury vapor short-arc lamps (OSRAM XBO or OSRAM HBO ) to illustrate the present invention. In a xenon short-arc lamp, the discharge arc burns in an atmosphere of pure xenon gas (or gas mixture) at high pressure. In mercury vapor short arc lamps, the atmosphere is mercury vapor and one or more inert gases. XBO lamps are used, for example, in conventional and digital movie projection and HBO lamps in the electronics industry, eg in microchip and LCD production.

[0016] This figure shows a schematic view of a high-pressure discharge lamp 1 with bases on both sides designed for DC operation in short-arc technology. The high-pressure discharge lamp has a discharge vessel 4 made of quartz glass with a discharge space 6 and two sealed bulb stems 8 , 10 arranged radially on the discharge vessel 4 , the free end sections of which can be A base sleeve (not shown) is provided in each case. Two electrode systems 14 , 16 running in ...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention relates to a discharge lamp (1), particularly a xenon or mercury vapor short arc lamp, comprising electrodes (22, 24) arranged in an interior of a discharge vessel (4). At least one of the electrodes (22) is designed in two parts, wherein a first part on the connection side is made of carbon and a second part (36) facing the discharge arc during operation is made of tungsten.

Description

technical field [0001] The invention relates to a discharge lamp according to the preamble of claim 1 . Background technique [0002] No. 6,573,657 B discloses a short-arc high-pressure discharge lamp having a discharge vessel surrounding a xenon gas filling. Two electrodes consisting entirely of tungsten are arranged within the discharge vessel. Especially for short-arc lamps in which the electrodes are heavily loaded, tungsten is usually used as the electrode material, since tungsten is a durable material which melts only at very high temperatures. On the downside, however, tungsten will be relatively difficult to process and expensive. Contents of the invention [0003] It is an object of the present invention to provide a discharge lamp which has a low technical outlay in production with simultaneously high mechanical strength. [0004] This object is solved by a discharge lamp with the features of claim 1 . [0005] Particularly advantageous developments emerge fr...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): H01J61/073
CPCH01J61/52H01J61/0732
Inventor 斯文-乌韦·巴克格哈德·莱夫勒迪尔克·罗森塔尔沃尔夫冈·塞茨
Owner OSRAM GMBH
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products