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Continuous exposure method and device

An exposure method and technology of a transmission device, which are applied to the exposure device of the photoengraving process and the microlithography exposure equipment, etc., can solve the problems such as blockage of the mold surface structure, affecting the quality and yield of optical film products, and scratches.

Inactive Publication Date: 2012-01-18
BRIVU TECH DANYANG
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Although the mold replication method can be used to make optical films, because the resin material is in direct contact with the mold, it is easy to clog the surface structure of the mold, affecting the quality and yield of optical film products, and the surface of the mold is easy to oxidize, and it is easy to produce defects caused by cleaning. scratches, the mold needs to be replaced frequently, which increases the production cost of the optical film

Method used

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  • Continuous exposure method and device
  • Continuous exposure method and device
  • Continuous exposure method and device

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0036] Depend on figure 1 Known, a continuous exposure method and device: the unwinding roller 101 includes a substrate placed thereon in the form of a roll, such as polyester (PET), polycarbonate (PC), polymethyl methacrylate (PMMA ) or other rollable material. The substrate discharged from the unwinding roller passes through the coating head 102, and one side of the substrate is coated with the material mixture to form a coating. The substrate can be conventionally pretreated, such as cleaned, destaticized, or can contain a precoat, or be corona treated to increase adhesion to the coating material. The material mixture contains photoinitiators such as benzyl dimethyl ketal, 4-methylbenzophenone, trimethylbenzophenone; photopolymerizable materials such as acrylic resins, polyester resins, polyurethanes, poly Vinyl chloride or silicone resins; additives such as defoamers, antistatic agents. The coating method of the coating head can be slit coating (Slot die), doctor blade ...

Embodiment 2

[0048] Figure 7 Shown is a second embodiment of the invention. Unwind roll 701 includes a substrate placed thereon in roll form. The substrate discharged from the unwinding roller passes through the coating head 702, and one side of the substrate is coated with the material mixture to form a coating. 703 and 704 are support rollers. 706 is a negative pressure box, which can be image 3 , Figure 4 The described negative pressure box, or other forms of negative pressure box, cause the substrates 705, 707 on either side of the negative pressure box to have different tensions. The mask plate 708 has a design pattern. The loose or less tensioned substrate is attached to the mask 708 by the gravity of the substrate and the coating, or with the assistance of negative pressure between the substrate and the mask. 720 is a light source, and 721 is a corresponding exposure area. The mask 708 and the light source 720 can be the mask and the light source described in Example 1, or...

Embodiment 3

[0053] Figure 8A third embodiment of the present invention is described. Unwind roll 801 includes a substrate placed thereon in roll form. The substrate discharged from the unwind roll passes through the coating head 802, and the material mixture is coated on one side of the substrate. 803 and 804 are support rollers. 806 is a negative pressure box. The substrate 805 located between the support roll 804 and the negative pressure box 806 has a set tension. After the base material passes through the negative pressure box 806, the tension is significantly reduced, so that the base material 807 is in a state of relaxation or less tension. The flexible mask plate 808 is a flexible mask plate with a design pattern, which can include a polyester base layer, which has better Dimensional stability; emulsion layer, such as silver salt emulsion layer, provides light-transmitting and light-blocking patterns; tie layer, promotes adhesion between emulsion layer and polyester base layer...

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PUM

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Abstract

The invention relates to a continuous exposure method and device. The continuous exposure method comprises the step of coating a material mixture on the surface of a moving substrate and is characterized by further comprising the steps of: enabling the substrate in a set area to be in a relaxation state or a state with lower tension, laminating the substrate in the relaxation state or the state with lower tension with a mask plate, driving the substrate and the mask plate by a mask plate transmission device to pass through an exposure area at same speed, separating the substrate and the mask plate which pass through the exposure area, and returning the mask plate separated from the substrate to an initial position through the transmission device. The continuous exposure device comprises a negative pressure box, the mask plate, an exposure light source and a mask plate transmission device. The continuous exposure method and device provided by the invention can be used for manufacturing optical diaphragms, optical filter arrays, photoelectric devices containing flexible substrates, or other diaphragms and devices which are in need of transferring patterns prefabricated on mask plates to surface coatings of the flexible substrates through an exposure system according to setting requirements, and can also be used in liquid crystal displays, LED (Light-Emitting Diode) illuminating devices or solar cell panels.

Description

technical field [0001] The invention relates to a method and a device for making an optical film used in a liquid crystal display, an LED lighting device and a solar cell panel and an optoelectronic component containing a bendable base material through a mask. Background technique [0002] Flat panel display technology including liquid crystal display (LCD) is playing an increasingly important role in people's life and work. Liquid crystal display combines liquid crystal-semiconductor technology, which is the most important technology in flat panel display at present. Liquid crystal displays usually contain a light source that emits light, called a backlight (BLU). The backlight contains an optical film, so that the light emitted from the backlight and passed through the liquid crystal to the front of the display is uniform in space, and the viewing angle is distributed according to certain requirements. Prism films, microlens films and their derivatives are very important...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/20
Inventor 路志坚杨星蒋健艺杨云胜
Owner BRIVU TECH DANYANG