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Device for realizing spray uniformity of MOCVD (Metal-Organic Chemical Vapor Deposition) and application of device

A uniform and uniform technology, applied in the field of MOCVD, can solve the problems of difficult processing, complex structure, and difficult to maintain stable use effect, and achieve the effect of uniform spraying and good uniformity

Inactive Publication Date: 2012-02-15
SHANGHAI ZHUORUI MATERIAL TECH
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  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0009] The purpose of the present invention: to achieve the goal of "three uniformities", to propose a device and device that can ideally realize the uniformity of MOCVD spraying, and at the same time overcome the complex structure, difficult processing, and The defect that the use effect is difficult to maintain stability

Method used

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  • Device for realizing spray uniformity of MOCVD (Metal-Organic Chemical Vapor Deposition) and application of device
  • Device for realizing spray uniformity of MOCVD (Metal-Organic Chemical Vapor Deposition) and application of device
  • Device for realizing spray uniformity of MOCVD (Metal-Organic Chemical Vapor Deposition) and application of device

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Embodiment Construction

[0031] The present invention will be further described below in conjunction with the accompanying drawings, and an embodiment of the present invention will be given.

[0032] This device to realize the uniformity of MOCVD spraying, through the design and layout of micropores, constructs two or three layers of independent spatial channels in the spray head for simultaneously transporting the three fluids of A group gas, B group gas and cooling water respectively. Make each layer of independent space channel extend to the surface of the shower head body to form the interface respectively connected with the external gas supply source and cooling water; at the same time, through the design of the inner bottom of the group A gas delivery channel 1 and the B group gas delivery channel 2 respectively The microporous channels 4 and 4' leading to the bottom surface 5 of the shower head constitute the spray surface of the MOCVD spray outlet that can fully realize "uniform flow rate", "un...

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Abstract

The invention provides a device for realizing spray uniformity of MOCVD (Metal-Organic Chemical Vapor Deposition), which is characterized in that: by a micro-pore design layout, two layers or three layers of independent pore canal spaces which are respectively used for conveying A-family gas, B-family gas and cooling water simultaneously are constructed in a spray head, and each layer of independent pore canal space extends to the surface of a spray head body to form an interface which is respectively connected with an external gas supply source and cooling water; and simultaneously, by micro-pore channels (4,4') which are respectively arranged at the bottom in an A-family gas conveying pore canal (1) and a B-family gas conveying pore canal (2) and are communicated to a bottom surface (5) of the spray head, a jet surface of an MOCVD spray outlet capable of fully realizing uniform flow rate, uniform components and uniform temperature is formed.

Description

technical field [0001] The invention relates to an MOCVD technology, in particular to a device and application for realizing the uniformity of MOCVD spraying. Background technique [0002] "Uniformity" is one of the core technical indicators of the Metal-Organic Chemical Vapor Deposition (MOCVD) system. Uniformity control is directly related to the quality of epitaxial growth of materials. It includes uniform flow rate, uniform composition, Three aspects of temperature uniformity: [0003] "Flow velocity uniformity" requires that the flow velocity of the sprayed gas on the spray surface of the end cover has a good consistency, which requires that the gas has formed a unidirectional, uniform and stable flow field inside the sprinkler before it reaches the spray. [0004] "Component uniformity" requires that the various components sprayed into the reaction chamber are mixed uniformly, but usually the flow field environment inside the reaction chamber will cause fluctuations i...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C16/455
Inventor 龚岳俊张瑜
Owner SHANGHAI ZHUORUI MATERIAL TECH
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