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Reflectance distribution curve modeling method, thickness measurement scheme and thickness measurement reflectometer using same

A modeling method and degree distribution technology, which is applied in the direction of semiconductor/solid-state device testing/measurement, instruments, measuring devices, etc., can solve problems such as inconsistencies, and achieve the effect of precise detection

Active Publication Date: 2012-02-22
SNU PRECISION CO LTD
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Problems solved by technology

[0005] However, when the light is incident in a specified wavelength band after passing through the band pass, there is a considerable error between the measured reflectance distribution curve and the reflectance distribution curve generated based on the existing modeling method, so Inconsistent
Therefore, the thickness of the film layer cannot be determined by existing modeling methods

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  • Reflectance distribution curve modeling method, thickness measurement scheme and thickness measurement reflectometer using same
  • Reflectance distribution curve modeling method, thickness measurement scheme and thickness measurement reflectometer using same
  • Reflectance distribution curve modeling method, thickness measurement scheme and thickness measurement reflectometer using same

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Embodiment Construction

[0022] Referring to the accompanying drawings, the modeling method of the reflectance distribution curve of the present invention, the thickness detection method using the method, and the embodiments of the thickness detection reflectometer will be described in detail below.

[0023] figure 1 is a schematic diagram of an embodiment of the thickness detection reflectometer of the present invention; figure 2 is through figure 1 The intensity distribution curve of the light in the bandpass of the linear variable filter of the thickness detection reflectometer; Figure 7 is a diagram illustrating an example of the surface shape of the inspected film layer.

[0024] Please refer to figure 1 , figure 2 and Figure 7 , the thickness detection reflectometer 100 of this embodiment includes a light source 110 , a linear variable filter 120 , a filter transfer unit 130 , a condenser lens 160 , an optical system 140 and an imaging unit 150 .

[0025] The light source 110 is used t...

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Abstract

The reflectance distribution curve modeling method of the present invention is for modeling a reflectance distribution of a thin film layer according to a change in the wavelength of light with respect to a thin film layer having a uniform thickness, and comprises: a reflectance distribution curve preparation step whereby a reflectance distribution curve is prepared to represent reflectance distribution of the thin film layer according to a change in wavelength of light; an input intensity setting step whereby an intensity distribution curve is prepared to represent intensity of light in a certain wavelength band around a specific wavelength for which white light was band-passed, and then the intensity distribution curve is integrated within the wavelength band to set as an input intensity of the specific wavelength; an output intensity setting step whereby a combined intensity distribution curve of the reflectance and intensity distribution curves is integrated within the wavelength band to set an output intensity of the specific wavelength; an integrated reflectance setting step whereby a value obtained by dividing the output intensity of the specific wavelength by the input intensity of the specific wavelength is set as an integration reflectance of the thin film layer for the specific wavelength; and an integration reflectance distribution curve generating step whereby an integration reflectance distribution curve for reflecting the integration reflectance distribution according to a change in wavelength is generated by repeating the input intensity setting step, the output intensity setting step and the integration reflectance setting step, while changing the specific wavelength.

Description

technical field [0001] The present invention relates to a reflectance distribution curve modeling method, a thickness detection method using the method, and a thickness detection reflector, in particular to improving the reflection of a thin film layer to light passing through a bandpass by means of integration in a specified wavelength band A reflectance distribution curve modeling method of the degree distribution curve modeling method, a thickness detection method using the method and a thickness detection reflector. Background technique [0002] The thickness distribution of the transparent thin film layer widely used in LCD and semiconductor fields has a great influence on the subsequent process in terms of its characteristics. There is therefore a need throughout the industry for a system capable of monitoring the thickness of thin film layers. In the detection of film layer thickness, widely used devices include non-contact detection devices Interferometer (Interfero...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G01B11/06H01L21/66
CPCG01B11/0625G01B11/0608G01B9/02012H04N23/56
Inventor 朴喜载安祐正金星龙
Owner SNU PRECISION CO LTD
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