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Device for measuring vertical position of workpiece bench

A vertical position and workpiece table technology, applied in the field of position measurement devices, can solve problems such as cosine errors, achieve high accuracy, reduce factors, and achieve high-precision measurement effects

Inactive Publication Date: 2012-03-14
SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD
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  • Abstract
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Problems solved by technology

Moreover, since this type of method measures the position of the workpiece table based on the length of the beam, it is easy to introduce cosine error

Method used

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  • Device for measuring vertical position of workpiece bench
  • Device for measuring vertical position of workpiece bench
  • Device for measuring vertical position of workpiece bench

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Embodiment Construction

[0036] Hereinafter, preferred embodiments of the present invention will be described in detail with reference to the accompanying drawings. In order to facilitate the description and highlight the present invention, related components in the prior art are omitted from the drawings, and the description of these well-known components will be omitted.

[0037] Such as figure 1 As shown, the measurement system of the present invention can be used to measure the optical position of a workpiece table in a lithography machine. figure 2 Shown is a measurement system constructed in accordance with the present invention. The system includes a laser 1, a modulation grating 2, a first microscope objective lens 3, a corner reflector 4 mounted on one side of a workpiece stage 5, a second microscope objective lens 6, a detection grating 7 and a detector 8. Among them, the modulation grating 2 and the detection grating 7 are both transmission gratings.

[0038] After the light beam generated by...

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Abstract

The invention relates to a device for measuring the vertical position of a workpiece bench. The device comprises a light source, a modulation light grating, a first microscope objective, the workpiece bench, a second microscope objective, a measurement light grating and a detector, wherein the light source is used for emitting parallel light beams; the modulation light grating is used for modulating the light beams from the light source; the first microscope objective is used for contracting the light beams from the modulation light grating; the second microscope objective is used for expanding measurement light beams which are reflected by the workpiece bench; the measurement light grating is used for receiving the measurement light beams from the second microscope objective; and the detector is used for receiving light beams which are emitted by the measurement light grating and measuring the light beams to acquire the height of an angle reflecting mirror. The lateral surface of the workpiece bench is provided with the angle reflecting mirror; the angle reflecting mirror reflects incident light beams back in parallel; an include angle is formed between light grating fringes on the measurement light grating and the light beam fringes transmitted to the measurement light grating; the periods of the two light gratings are more than 100 times of the wave length of the light beams emitted by the light source; and the light beams pass through the measurement light grating to form moire fringes.

Description

Technical field [0001] The invention relates to a measuring device for measuring the position of a moving table, in particular to a measuring device for measuring the vertical position of a workpiece table in a photoetching machine. Background technique [0002] Optical position measurement technology is more and more widely used in various finishing equipment. Compared with other measurement methods, optical measurement has many advantages such as non-contact and high precision. As the pearl of finishing equipment, the lithography machine uses optical measurement as the core tool for all position measurement. [0003] The workpiece table used to hold silicon wafers and masks has higher horizontal accuracy requirements than vertical accuracy. With the increasing process requirements, in recent years, the vertical position of the workpiece table is gradually required to be measured quickly and accurately. [0004] For this reason, US patents US7,355,719 B2, US7,158,236 B2, and US6,...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G01B9/02G03F7/20
Inventor 林彬张俊
Owner SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD
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