Method for removing surface dust of mask plate

Abstract

The invention relates to a method for removing dust, especially relates to a method for removing surface dust of a mask plate. According to the invention, under the premise that the air blowing pressure is not raised, the method for removing the surface dust of the mask plate can eliminate the adsorption capacity of the dust through blowing ionic wind to neutralize the electrical property of the charged dust, thereby the dedusting efficiency can be raised, the charged dust can be removed, the risk of destroy on the mask plate is reduced, and the technology is simple and easy to operate.

Description

technical field [0001] The invention relates to a method for removing fine dust, in particular to a method for removing fine dust on the surface of a mask plate. Background technique [0002] The mask used in the semiconductor chip manufacturing industry has high requirements on dust. When the particle size of the dust is large enough, it will be projected onto the silicon wafer during the photolithography process and destroy the chip circuit pattern, so it must be removed; clean the surface of the mask. The method of removing dust is generally to use blowing to remove the dust on the mask, such as blowing air gun to blow nitrogen air, air curtain, etc.; but because the surface of the mask is generally adsorbed with charged dust, such as figure 1 As shown, when the blowing air gun 3 is used for simple air blowing, the charged particles 4 cannot be removed when the air blowing pressure is low, and increasing the air blowing pressure will cause certain damage to the mask plate...

AI Technical Summary

Problems solved by technology

[0002] The mask used in the semiconductor chip manufacturing industry has high requirements on dust. When the particle size of the dust is large enough, it will be projected onto the silicon wafer during the photolithography process and destroy the chip circuit pattern, so it must be removed; clean the surface of the mask. The method of removing dust is generally to use blowing to remove the dust on the mask, such as blowing air gun to blow nitrogen air, air curtain, etc.; but because the surface of the mask is generally adsorbed with charged dust, such as figure 1 As shown, when the blowing air gun 3 is used for simple air blowing, the charged particles 4 cannot be removed when the air blowing pressure is low, and increasing the air blowing pressure will cause certain damage to the mask plate 1, especially for hundreds of The damage to the micron-thick mask protection film 2 (pellicle) is serious, and it can even lead to its scrapping

[0003] However, at present, there is no method that can improve the dust removal efficiency, remove a little dust, and reduce the risk of damaging the mask without increasing the blowing pressure.

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