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Preparation method for inhomogeneous dielectric substrate

A non-uniform medium and substrate technology, which is applied in the field of manufacturing and processing of metamaterial substrates, can solve problems such as difficulty in meeting the electromagnetic properties of dielectric substrates, and achieve the effect of satisfying the requirements of electromagnetic properties and simple preparation process.

Inactive Publication Date: 2012-05-30
KUANG CHI INST OF ADVANCED TECH +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, most traditional PCB substrates are homogeneous dielectric substrates, which are difficult to meet the requirements for electromagnetic properties of dielectric substrates.

Method used

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  • Preparation method for inhomogeneous dielectric substrate
  • Preparation method for inhomogeneous dielectric substrate
  • Preparation method for inhomogeneous dielectric substrate

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0018] see figure 1 , is a flowchart of a method for preparing a heterogeneous dielectric substrate provided in Embodiment 1 of the present invention, and the method includes:

[0019] S11: configuring a resin solution with a preset concentration.

[0020] Wherein, the resin solution with the preset concentration is polysulfone (PSF / PSU) solution; or polyvinylidene fluoride (PVDF) solution. The concentration of the polysulfone solution is 15-20%; the concentration of the polyvinylidene fluoride solution is 10-20%.

[0021] S12: coating the resin solution on the upper surface of the non-woven fabric to form a layer of liquid film.

[0022] Wherein, the non-woven fabric is a continuous medium layer with a preset width.

[0023] S13: The non-woven fabric with the liquid film on the upper surface is brought into the first water tank with the first temperature through the roller, and at the same time, the second water tank above the first water tank sprays the temperature downwa...

Embodiment 2

[0031] see figure 2 , is a flowchart of a method for preparing a heterogeneous dielectric substrate provided in Embodiment 2 of the present invention, and the method includes:

[0032] S21: Prepare a polysulfone solution with a concentration of 17%.

[0033] S22: Coating a polysulfone solution with a concentration of 17% on the upper surface of the non-woven fabric to form a layer of liquid film.

[0034] S23: Bring the non-woven fabric with a liquid film on the upper surface to a position 0.6 mm below the water surface of the first water tank whose water temperature is normal temperature. The sink sprays water with a temperature rising from 10°C in the center of the non-woven fabric to 52°C at the edge.

[0035] S24: Remove the liquid film, put it into a forced air drying oven at a temperature of 60° C. for drying to obtain a non-uniform dielectric substrate.

[0036] Compared with the first embodiment, this embodiment describes the technical solution of the present inven...

Embodiment 3

[0038] see image 3 , is a flow chart of a method for preparing a heterogeneous dielectric substrate provided in Embodiment 3 of the present invention, and the method includes:

[0039] S31: Prepare a polyvinylidene fluoride solution with a concentration of 15%.

[0040] S32: Coating a polyvinylidene fluoride solution with a concentration of 15% on the upper surface of the non-woven fabric to form a layer of liquid film.

[0041] S33: Bring the non-woven fabric with the liquid film on the upper surface to a position 0.4 mm below the water surface of the first water tank whose water temperature is normal temperature, and at the same time, the second water tank above the first water tank is equal in width and length to the first water tank. The sink sprays water with a temperature rising from 10°C in the center of the non-woven fabric to 52°C at the edge.

[0042] S34: Remove the liquid film, put it into a forced air drying oven at a temperature of 60° C. for drying to obtain ...

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Abstract

The embodiment of the invention provides a preparation method for a dielectric substrate. The preparation method comprises the following steps of: preparing a resin solution with a preset concentration; coating the resin solution on the upper surface of a non-woven fabric so as to form a layer of liquid film; dragging the non-woven fabric of which the upper surface is provided with the liquid film in a first water tank with a first temperature through a rolling shaft, wherein a second water tank which is located above the first water tank downwardly sprays water, and the temperature of the water sequentially changes from the center of the non-woven fabric to the edge of the non-woven fabric; and taking the liquid film out of the first water tank, putting the liquid film in a drying oven for drying, and then, obtaining the inhomogeneous dielectric substrate. The preparation method has the advantages of lowering the complexity of a technological process for preparing the inhomogeneous dielectric substrate and increasing the preparation efficiency.

Description

【Technical field】 [0001] The invention relates to the technical field of manufacturing and processing metamaterial substrates, in particular to a method for preparing a heterogeneous dielectric substrate. 【Background technique】 [0002] In recent years, with the rapid development of high-tech such as radar detection, satellite communication, and aerospace, as well as the rise of research fields such as anti-electromagnetic interference, stealth technology, and microwave anechoic chambers, research on microwave-absorbing materials has attracted more and more attention. Metamaterials can exhibit very wonderful electromagnetic effects, and can be used in the fields of wave-absorbing materials and invisible materials, becoming a research hotspot in the field of wave-absorbing materials. [0003] The properties and functions of metamaterials mainly come from their internal structures. How to accurately prepare three-dimensional fine structures with periodic arrangements has becom...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C08J9/28C08J5/18C08L81/06C08L27/16
Inventor 刘若鹏金曦张影
Owner KUANG CHI INST OF ADVANCED TECH
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