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Chemical vapor deposition furnace capable of realizing upper and lower air inlet switching and application thereof

A technology of chemical vapor deposition and air intake pipe, which is applied in the direction of gaseous chemical plating, metal material coating process, coating, etc., which can solve the problems of difficult control of product quality, protracted production time, and increased production cost, and achieve the goal of overcoming deposition coating. The effect of uneven coverage and simple and easy operation

Active Publication Date: 2012-07-04
刘汝强
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

When the existing deposition furnace with a single gas inlet and outlet method produces different products, it is often necessary to readjust or change the furnace or product placement in the reaction chamber, or design and manufacture new fixture workpieces to meet different production needs, resulting in Prolonged production time, increased production costs, and difficult to control product quality

Method used

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  • Chemical vapor deposition furnace capable of realizing upper and lower air inlet switching and application thereof
  • Chemical vapor deposition furnace capable of realizing upper and lower air inlet switching and application thereof
  • Chemical vapor deposition furnace capable of realizing upper and lower air inlet switching and application thereof

Examples

Experimental program
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Effect test

Embodiment 1

[0030] A chemical vapor deposition furnace capable of switching between upper air intake and lower air intake, comprising a furnace body 13, a deposition chamber 14, an air inlet pipe and an air outlet pipe, the top of the deposition chamber 14 has an upper vent 20, and the bottom has a lower vent 18, The deposition chamber 14 is arranged in the furnace body 13;

[0031] Directly below the vent 18 under the deposition chamber 14 is provided with a three-way chamber 19, which is a closed chamber provided with an upper hole 21, a lower hole 23 and a side hole 22; the upper hole 21 of the three-way chamber 19 is connected to the deposition chamber. The lower ventilation port 18 of the chamber 14 is airtightly connected, and the side hole 22 of the three-way chamber 19 is opposite to the lower outlet pipe mouth;

[0032] The upper vent 20 of the deposition chamber 14 is connected with an upper three-way pipe 5, the side opening of the upper three-way pipe 5 is connected with the u...

Embodiment 2

[0037] A chemical vapor deposition furnace capable of switching between upper air intake and lower air intake, comprising a furnace body 13, a deposition chamber 14, an air inlet pipe and an air outlet pipe, the top of the deposition chamber 14 has an upper vent 20, and the bottom has a lower vent 18, The deposition chamber 14 is arranged in the furnace body 13;

[0038] Directly below the vent 18 under the deposition chamber 14 is provided with a three-way chamber 19, which is a closed chamber provided with an upper hole 21, a lower hole 23 and a side hole 22; the upper hole 21 of the three-way chamber 19 is connected to the deposition chamber. The lower ventilation port 18 of the chamber 14 is airtightly connected, and the side hole 22 of the three-way chamber 19 is opposite to the lower outlet pipe mouth;

[0039] The upper vent 20 of the deposition chamber 14 is connected with an upper three-way pipe 5, the side opening of the upper three-way pipe 5 is connected with the u...

Embodiment 3

[0048] The application of the chemical vapor deposition furnace described in Example 2, which can realize switching between upper air intake and lower air intake, includes two ways of gas entering from the top and exiting from the bottom, and gas entering from the bottom and exiting from the top. The steps of gas in and out are as follows:

[0049] Use graphite block 1 to block the mouth of the upper tee pipe 5 close to the furnace wall, and simultaneously remove the graphite inlet pipe 2 from the connecting part 8, and take it out through the side hole 22 of the tee chamber 19, and close the lower inlet. Trachea 10 is positioned at the pipe mouth in the connection part, and when ventilating and evacuating, the control valve I 3 of lower air intake pipe 10 is closed, and the control valve II 4 of upper air intake pipe 9 is opened simultaneously; Then, the control valve III 7 of upper air outlet pipe 11 is closed. Close and open the control valve IV6 of the lower outlet pipe 12...

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PUM

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Abstract

The invention relates to a chemical vapor deposition furnace capable of realizing upper and lower air inlet switching and application thereof. The chemical vapor deposition furnace comprises a furnace body, a deposition chamber, an air inlet pipe and an air outlet pipe, wherein the deposition chamber is arranged inside the furnace body; the air inlet pipe comprises an upper air inlet pipe and a lower air inlet pipe; the air outlet pipe comprises an upper air outlet pipe, a lower air outlet pipe and a total air outlet pipe; the upper air inlet pipe and the lower air inlet pipe are respectivelyprovided with a control valve; and the upper air outlet pipe and the lower air outlet pipe are respectively provided with a control valve. The chemical vapor deposition furnace provided by the invention overcomes the defects of uneven deposition and coating on the surfaces of products, caused by a single airflow inlet / outlet manner, in the conventional deposition manner.

Description

technical field [0001] The invention relates to a chemical vapor deposition furnace capable of switching between upper and lower gas inlets and an application thereof, belonging to the technical field of chemical vapor deposition. Background technique [0002] At present, most of the chemical vapor deposition furnaces adopt one of the gas circulation modes of upper inlet and lower outlet or lower inlet and upper outlet. No matter which way the positions of the inlet and outlet are relative up and down, the gas material of the deposition furnace The flow direction is single and fixed. For example, the patent document CN2218916 (application number 94232049.2) relates to a chemical vapor deposition induction furnace for manufacturing pyrolytic boron nitride products. The middle and lower part of the utility model furnace body is provided with a graphite sleeve heating element surrounding the induction coil, and the mold base stands on a rotating on the base. [0003] For diff...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C16/455
Inventor 刘汝强
Owner 刘汝强