Cleaning method and cleaning and drying equipment for improving cleanness of wafer
A technology for cleanliness and wafers, applied in cleaning methods and tools, cleaning methods using liquids, chemical instruments and methods, etc., can solve the problems affecting the cleanliness, yield and reliability of wafers, and the cleanliness of wafer surfaces , Impurities cannot be completely removed and other problems, to achieve the effect of simple and easy improvement, reducing the possibility of liquid residue, and avoiding the effect of liquid residue
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[0031] In order to make the content of the present invention clearer and easier to understand, the content of the present invention will be further described below in conjunction with the accompanying drawings. Of course, the present invention is not limited to this specific embodiment, and general replacements known to those skilled in the art are also covered within the protection scope of the present invention.
[0032] Secondly, the present invention is described in detail by means of schematic diagrams. When describing the examples of the present invention in detail, for the convenience of explanation, the schematic diagrams are not partially enlarged according to the general scale, which should not be used as a limitation of the present invention.
[0033] figure 2 It is a schematic flowchart of a method for washing and drying wafers in an embodiment of the present invention. combine figure 2 , the present invention provides a kind of method that can improve wafer cl...
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