Solar battery diffusion method
A solar cell and diffusion method technology, applied in the field of crystalline silicon solar cell manufacturing, can solve problems such as reduced filling, increased series resistance, and low-efficiency sheets in the production line, so as to reduce surface recombination and defect concentration, increase conversion efficiency, and improve The effect of conversion efficiency
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[0045] Example 1:
[0046] The raw material is P-type monocrystalline silicon wafer with a thickness of 200±20um and a resistivity of 0.5-6W.cm. After surface cleaning and surface texture treatment, a 2-5nm regular pyramid suede is formed on the surface. The sheet is placed in a diffusion furnace.
[0047] Step 1: first oxidation
[0048] The diffusion furnace is heated to 820°C, the flow rate of oxygen is 10slm, and the time of oxygen is 15min to form a 20nm oxide layer;
[0049] Step two, diffusion
[0050] 2.1, the first proliferation
[0051] The temperature of the diffusion furnace is raised to 840°C, the flow rate of the small nitrogen is 1.2 slm, the flow rate of the large nitrogen is 9 slm, the flow rate of the oxygen is 1.3 slm, and the mixed gas is introduced for 6 minutes;
[0052] 2.2, the second diffusion
[0053] The diffusion furnace is heated to 850°C, the flow rate of the small nitrogen is 1.0 slm, the flow rate of the large nitrogen is 9 slm, the flow rate of the oxygen ...
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