Fluid delivery device and fluid delivery method

Abstract

A liquid delivery device for feeding a processing liquid with a required foaming rate and a liquid delivery method are provided. The liquid delivery device comprises a first fluid passage though which a gas-bearing liquid flows; a second fluid passage communicated with the first fluid passage and having an opening area smaller than an opening area of the first fluid passage. If a first pressure of the liquid flowing in the first fluid passage is P1, a first flow rate of the liquid flowing in the first fluid passage V1, a second pressure of the liquid flowing in the second fluid passage is P2, a second flow rate of the liquid flowing in the second fluid passage V2, the density of the liquid is [rho], the gravitational acceleration is g, an urgent-shrinkage loss coefficient is fsc, a flow quantity of the fluid is Q, the opening area of the first passage is S1, and the opening area of the second passage is S2, the pressure difference of the first pressure P1 and the second pressure P2, the flow quantity Q, the opening area of the first passage S1 and the opening area of the second passage S2 satisfy the formulae: P1-P2=((1+fsc)*V2<2> / 2g-V1<2> / 2g)*[rho]g, Q=V1*S1=V2*S2, wherein the Reynolds number of the liquid flowing in the second fluid passage is the value of generating turbulent flow in the second fluid passage.

Description

technical field [0001] Embodiments of the present invention relate to a liquid feeding device and a liquid feeding method. Background technique [0002] The liquid delivery device is, for example, provided with a tank and piping, and supplies the liquid in the tank to a supply target device such as a processing device, a substrate processing device, and the like by flowing through the piping. The processing device is a device that processes workpieces such as metal parts and substrates with processing tools such as cutting blades and drills. The processing parts of the workpiece processed by the processing tools are used for the purpose of lubrication, cooling and cleaning. The liquid is supplied with a processing liquid in which gas is mixed. (For example, refer to Patent Document 1). [0003] In addition, a substrate processing device is a device that processes a processing liquid on a substrate surface such as a semiconductor wafer or a glass substrate in a manufacturin...

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Problems solved by technology

[0005] However, the treatment performance of the treatment liquid cannot be sufficiently improved by simply supplying the treatment liquid in which the gas is simply mixed or dissolved in the liquid as described above to the supply target device. Therefore, for example, in a processing device, based on processing Insufficient lubrication and cleaning by the liquid, the life and processing performance of the processing tool are hardly improved.

In addition, in the substrate processing equipment, the cleaning and resist removal by the processing liquid are not sufficient, and the product quality is hardly improved.

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