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Exposure method and exposure device

An exposure method and an exposure area technology, which are applied in the direction of photolithography exposure device, microlithography exposure equipment, etc., can solve the problems of long manufacturing cycle, high material cost, and angular difference of the filter layer, etc., and achieve the goal of reducing the angular difference Effect

Inactive Publication Date: 2014-10-22
BOE TECH GRP CO LTD +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

In this way, there will be a protrusion 730' at the place where the filter layer overlaps with the black matrix, causing the angular segment difference of the filter layer
Angular segment difference will affect the coating of the alignment layer of the liquid crystal display device, the liquid crystal orientation, etc., thereby affecting the display effect of the liquid crystal display device
The traditional method of reducing the angular difference is to add a flat layer to flatten the angular difference after the pattern of the filter layer is formed, which leads to complicated manufacturing process of the color filter, long manufacturing cycle and high material cost

Method used

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Embodiment Construction

[0053] The following will clearly and completely describe the technical solutions in the embodiments of the present invention with reference to the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only some, not all, embodiments of the present invention. Based on the embodiments of the present invention, all other embodiments obtained by persons of ordinary skill in the art without making creative efforts belong to the protection scope of the present invention.

[0054] The exposure method of the first embodiment of the present invention, such as figure 2 shown, including:

[0055] placing the substrate under the mask plate, and the substrate is parallel to the mask plate, wherein the substrate includes a transparent base and a photoresist coated on the transparent base;

[0056] Use at least two exposure rays to expose the photoresist through the mask plate; wherein, at least two exposure rays pass through the same ...

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Abstract

The invention discloses a method and a device for exposure. The method for exposure comprises the following steps of 1, putting a base plate under a mask plate, wherein the base plate is parallel to the mask plate and the base plate comprises a transparent base and a photoresist coated on the transparent base, and 2, carrying out exposure of the photoresist by at least two exposure lights passing through the mask plate, wherein the at least two exposure lights pass through the same exposure zone of the mask plate and expose the photoresist; each one of the at least two exposure lights passing through the same exposure zone forms an irradiation zone on the photoresist; and the at least two irradiation zones partly overlap. The device for exposure comprises a mask plate bearing unit, a base plate bearing unit and an exposure light formation unit. The method and the device for exposure realize different thickness values of the same formed graphic unit and provide a precondition for reducing an angle difference.

Description

technical field [0001] The invention relates to the field of manufacturing liquid crystal display devices, in particular to an exposure method and an exposure device. Background technique [0002] With the development of display technology, liquid crystal display devices have gradually become the mainstream of the market. Liquid crystal display devices are developing towards full color, large size, high resolution and low cost. Therefore, liquid crystal display devices need to use color filters to achieve color display effects, and the requirements for color filters are increasing. high. [0003] The color filter is mainly composed of a transparent substrate, a black matrix pattern and a filter layer pattern. In order to avoid light leakage at the edge of the filter layer, the filter layer overlaps with the black matrix. In the manufacturing process of the color filter, the black matrix pattern is first formed on the transparent substrate; then the photoresist of the filte...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G03F7/20
Inventor 王耸万冀豫吴洪江
Owner BOE TECH GRP CO LTD
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