Manufacture method of phase-shift optical mask

Abstract

The invention provides a manufacture method of a phase-shift optical mask. On a phase-shift optical mask substrate containing first photoresist capable of forming a hard film, a first domain graph structure is formed in the first photoresist through first photoetching. After the first domain graph structure is heated and cured, a cross linking material is coated on the first photoresist so as to cure the first domain graph structure in the first photoresist, an isolation film which is not soluble in second photoresist is formed, and redundant cross linking materials are removed. The second photoresist is coated on the first photresist. Second photoetching is conducted so as to form a second domain graph structure in a second photoresist film. A first domain graph and a second domain graph in the photoresist are transferred to a molybdenum silicide film which is partially light-transmitting and a non-transmitting chromium film respectively, and manufacture of the phase-shift optical mask is finished. The method reduces etching steps in the phase-shift optical mask manufacture process, productivity can be improved effectively, and manufacture cost can be reduced effectively.

Description

technical field [0001] The invention relates to the field of semiconductor manufacturing, and more specifically, the invention relates to a method for manufacturing a phase shift photomask. Background technique [0002] Photolithography is one of the key processes for making large-scale integrated circuits. The photolithography process is to transfer the layout pattern on the photomask to the photoresist film, and the photoresist film containing the layout pattern is used as a mask for the subsequent ion implantation or etching process. Photomasks play an important role in the photolithography process. With the continuous improvement of the integration level of semiconductor chips and the continuous reduction of the feature size of transistors, the requirements for photolithography technology are getting higher and higher, and phase shift photomasks have gradually become the mainstream photomasks of high-end photolithography technology. [0003] Such as Figure 1A As shown...

AI Technical Summary

Problems solved by technology

[0007] However, the steps of the phase-shift photomask manufacturing process according to the prior art are still not simplified enough

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