A Via-First Dual Damascus Copper Interconnect Method for Reducing Redundant Metal Coupling Capacitance

A redundant metal and through-hole priority technology, which is applied in the direction of circuit, electrical components, and pattern surface photolithography, to improve performance, reduce production costs, and increase productivity.

Active Publication Date: 2016-05-11
SHANGHAI HUALI MICROELECTRONICS CORP
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

Its cost is much higher than traditional single exposure forming technology

Method used

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  • A Via-First Dual Damascus Copper Interconnect Method for Reducing Redundant Metal Coupling Capacitance
  • A Via-First Dual Damascus Copper Interconnect Method for Reducing Redundant Metal Coupling Capacitance
  • A Via-First Dual Damascus Copper Interconnect Method for Reducing Redundant Metal Coupling Capacitance

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Embodiment Construction

[0034] In order to make the content of the present invention clearer and easier to understand, the content of the present invention will be described in detail below in conjunction with specific embodiments and accompanying drawings.

[0035] Figure 3A to Figure 3IA cross-sectional view schematically shows various steps of a via-first dual damascene copper interconnection method for reducing redundant metal coupling capacitance according to a preferred embodiment of the present invention. The via-first dual damascene copper interconnect method utilizes double exposure technology and formable hard film photoresist to reduce redundant metal coupling capacitance.

[0036] Specifically, as Figure 3A to Figure 3I As shown, according to the preferred embodiment of the present invention, the via-first dual damascene copper interconnection method for reducing redundant metal coupling capacitance includes:

[0037] The first step: first deposit a dielectric layer 2 on the substrate...

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Abstract

The invention discloses a through-hole-priority dual damascene copper interconnection method for reducing coupling capacitance of redundant metal. According to the through-hole-priority dual damascene copper interconnection method for reducing the coupling capacitance of the redundant metal, a dielectric layer is firstly deposited on a substrate silicon wafer and then the dielectric layer is coated with first photoresist; a through hole and a redundant metallic groove are formed in a first photoresist film through exposure and development, and the metallic groove formed in the first photoresist penetrates through the first photoresist; in the same developing machine, the first photoresist is coated with a SAFIER to solidify the through hole and the redundant metallic groove which are formed in the first photoresist, the SAFIER can react with the surface of the first photoresist to form an isolating film which can not dissolve in second photoresist under the heating condition, and then the remaining SAFIER which does not react with the surface of the first photoresist is removed; the first photoresist on which the isolating film is formed is coated with the second photoresist, and the anti-etching capacity of the first photoresist is larger than that of the second photoresist; a metallic groove located in the through hole is formed in a second photoresist film through exposure and development.

Description

technical field [0001] The invention relates to the field of semiconductor manufacturing, and more specifically, the invention relates to a through-hole priority double damascene copper interconnection method for reducing redundant metal coupling capacitance. Background technique [0002] As the integration level of semiconductor chips continues to increase, the feature size of transistors continues to shrink. After entering the 130nm technology node, limited by the high resistance characteristics of aluminum, copper interconnection gradually replaces aluminum interconnection and becomes the mainstream of metal interconnection. Since the copper dry etching process is not easy to realize, the manufacturing method of the copper wire cannot be obtained by etching the metal layer like the aluminum wire. The widely used manufacturing method of copper wire is damascene technology called damascene process. [0003] Damascus damascene copper interconnects can be realized through a...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01L21/768H01L21/027G03F7/00G03F7/40
Inventor 毛智彪
Owner SHANGHAI HUALI MICROELECTRONICS CORP
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