Manufacturing method of pixel structure

Abstract

The invention relates to a manufacturing method of a pixel structure. The method comprises the following steps of: firstly, providing a substrate on which a first conductive layer is formed, providing a first cover above the first conductive layer, and irradiating the first conductive layer through the first cover by using laser to form a gate; secondly, forming a gate insulating layer on the substrate to cover the gate; thirdly, simultaneously forming a channel layer, a source and a drain on the gate insulating layer above the gate, wherein the gate, the channel layer, the source and the drain form a thin film transistor; fourthly, forming a graphical protection layer on the thin film transistor, wherein the graphical protection layer is exposed from part of the drain; and finally, forming a pixel electrode which is electrically connected to the drain. The gate is manufactured in a laser ablation mode, so manufacturing of the channel layer, the source and the drain can be simultaneously completed. Therefore, compared with a common pixel structure manufacturing method, the manufacturing method of the pixel structure has the advantages that process steps can be simplified, and the manufacturing cost of an optical mask is reduced.

Description

[0001] This application is a divisional application of an invention patent application with a filing date of December 26, 2007, an application number of 200710305314.2, and an invention title of "Method for Making a Pixel Structure". technical field [0002] The present invention relates to a method for manufacturing a pixel structure, and in particular to a method for manufacturing a pixel structure using a laser ablation process to make a protective layer. Background technique [0003] A display is a communication interface between people and information, and flat-panel displays are currently the main development trend. There are mainly the following types of flat panel displays: organic electroluminescence display, plasma display panel, and thin film transistor liquid crystal display. Among them, thin film transistor liquid crystal display is the most widely used. Generally speaking, a thin film transistor liquid crystal display is mainly composed of a thin film transist...

AI Technical Summary

Problems solved by technology

Since the cost of the photomask is very expensive, and each photomask process must use a photomask with different patterns, if the number of photomask processes cannot be reduced, the manufacturing cost of the pixel structure 90 will not be reduced.

[0006] In addition, as the size of thin film transistor liquid crystal display panels increases, the size of the photomask used to make the thin film transistor array substrate will also increase accordingly, and the large size photomask will be more expensive in cost, making the pixel structure The manufacturing cost of 90 cannot be effectively reduced

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