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Arc evaporation source with defined electric field

A technology of arc evaporation and voltage source, applied in the direction of vacuum evaporation plating, circuit, discharge tube, etc., to achieve the effect of high coating rate

Active Publication Date: 2016-02-17
OERLIKON SURFACE SOLUTIONS AG PFAFFIKON
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, the disadvantage here is that only a part of the magnetic field emitted by the target leads to the anode

Method used

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  • Arc evaporation source with defined electric field
  • Arc evaporation source with defined electric field
  • Arc evaporation source with defined electric field

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Embodiment Construction

[0023] In order to better understand the present invention, the situation of arc sources according to the prior art will first be briefly described below. figure 2 A prior art arc evaporation source 201 is shown with an anode 203 spaced from a source cathode 209 . The source cathode is cooled by a cooling device 211 and connected to the negative pole 213 of a DC current source. Behind the source cathode is placed a magnetic mediator 215 responsible for establishing a magnetic field above the target surface. A focal point 205 emits a high current and thus emits many electrons into the evaporation chamber. An arc plasma is provided as a conductive medium. Since the anode 203 is not directly in the vicinity of the focal point 205 according to the prior art, the charged particles have to cross the magnetic field on their way to the distant anode. Associated is the motion of a charged particle with charge q, mass m and velocity v at position r in an electric field E(r) and magn...

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Abstract

The invention relates to an arc evaporation device having a cathode, an anode, a voltage source which places the anode at a positive potential relative to the cathode. The device further comprises a magnetic mediator which induces a magnetic field on the surface of the cathode, wherein the anode is arranged in the vicinity of the cathode such that magnetic field lines emanating from the surface of the cathode reach the anode superior.

Description

technical field [0001] The invention relates to an arc evaporation source. In this description arc evaporation source means a device with which an arc can be generated in vacuum with its focal point on the cathode, where the material to be evaporated is supplied by the cathode (= target) and the focal point Evaporation of the target material is caused. Background technique [0002] Arc evaporation sources are well known in the art. Snaper in US3625848 discloses a "beam gun" with a cathode and an anode arranged so that a spark discharge can take place therebetween. In this case, the cathode is formed from the material to be segregated. The anode described therein has a geometry that is conically tapered and placed directly adjacent to a cylindrical cathode. exist figure 1 An arrangement according to this prior art is shown in . No magnetic mediators are used in this arrangement. Consequently, the movement of the focal point on the target is as it is now very slow, alth...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C23C14/02C23C14/32C23C14/35C23C14/58C23C14/00
CPCC23C14/0089C23C14/021C23C14/325C23C14/5873C23C14/35H01J37/32055C23C14/32C23C14/02C23C14/58
Inventor S.克拉斯尼策尔J.哈格曼
Owner OERLIKON SURFACE SOLUTIONS AG PFAFFIKON