Mask plate and manufacturing method thereof

Abstract

The present invention discloses a mask plate, which comprises a mask plate body, wherein a light transmission region of the mask plate body has a light transmission film prepared from a photoresist, and light absorbance of the light transmission film is gradually increased from the center line to the direction of non-light transmission regions on both sides. According to the present invention, light absorbance of a light transmission film is gradually increased from the center line to the direction of non-light transmission regions on both sides so as to reduce a diffraction effect of the light in the light transmission region toward the direction of the non-light transmission region, the light absorbance of the light transmission film from the center line to the direction of the non-light transmission regions on both sides is a gradual change process, and light on the center region of the light transmission region diffracts toward positions on both sides of the light transmission region, such that intensity of the whole light transmission region light emitting on the photoresist on the surface of the substrate is uniform, widths of both sides of the photoresist remaining on the substrate can be well controlled during exposure development, uniformity of both side edges of the photoresist is good, burrs are less, and control accuracy of line width of the obtained structure is increased. The present invention further provides a preparation method for the mask plate.

Description

technical field [0001] The invention relates to the technical field of display panel processing, in particular to a mask plate and a preparation method thereof. Background technique [0002] In the field of display panel technology, with the development of high-resolution display technology, the number of pixels per unit size in the display panel is gradually increasing, and the pixel size is continuously decreasing. In order to maintain the aperture ratio, the pixel array in the array substrate The line width of the electrode wiring and the black matrix in the color filter substrate should also be reduced accordingly. [0003] In the preparation process of narrow line width, the essence of light is electromagnetic wave, and the diffraction effect of electromagnetic wave itself, in the traditional exposure and development process, it is difficult to realize the narrow line width process. [0004] In order to overcome the influence of the above-mentioned light diffraction ef...

AI Technical Summary

Problems solved by technology

The advantage of using this mask to prepare narrow line widths is that the effect of narrow line width can be achieved only by changing the sawtooth design of the non-transparent area in the mask. However, the burrs on both sides of the structure obtained by using this mask are relatively small. much, not smooth enough

[0006] SSM (Slit Shot mask) mask design, such as figure 2 as shown, figure 2 The mask plate shown adjusts the exposure amount by reducing the width a of its non-transparent region 02, and then obtains a photoresist with a narrower line width. This method just utilizes the diffraction of light, but after exposure and development, the substrate It is difficult to control the line width of the remaining photoresist 021 on 04, and it is difficult to control the line width of the final structure

[0007] GTM mask design such as image 3 as shown, image 3 The mask shown in the mask changes the transmittance of each part of the non-transparent region through the stepped non-transparent region. For example, the transmittance of the middle part 032 of the non-transparent region is smaller than the transmittance of the edge part 031. In order to achieve the effect of narrow line width, image 3 In the non-transmissive area shown in , the light transmittance is shown by the broken line 034; although this mask can also obtain photoresist 033 with a narrow line width, when using this mask for exposure, its non-transmissive The diffraction effect of light at the edge of the light area is also difficult to control, and the obtained line width is also difficult to control

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