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Substrate processing apparatus and processing liquid application method

A substrate processing device and processing liquid technology, which can be applied in the manufacture of devices, electrical components, and semiconductor/solid-state devices that coat surfaces with liquids.

Inactive Publication Date: 2016-02-10
DAINIPPON SCREEN MTG CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0007] However, since the pipes disclosed in Patent Document 1 or Patent Document 2 are flexible, a part of the pipes tends to be deformed by twisting or the like due to movement or vibration of the slider.

Method used

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  • Substrate processing apparatus and processing liquid application method
  • Substrate processing apparatus and processing liquid application method
  • Substrate processing apparatus and processing liquid application method

Examples

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Embodiment Construction

[0034] Hereinafter, embodiments of the present invention will be described with reference to the drawings. The following embodiments are examples of the embodiment of the present invention, and do not limit the protection scope of the present invention.

[0035] figure 1 It is a schematic plan view showing the substrate processing apparatus 20 of this embodiment. figure 2 It is a schematic front view showing the substrate processing apparatus 20 . image 3 yes figure 2 The illustrated substrate processing apparatus 20 is a schematic sectional view taken along line I-I. in addition, Figure 4 It is a schematic perspective view schematically showing the arrangement relationship of main parts of the substrate processing apparatus 20 .

[0036] In addition, in the following description, XYZ rectangular coordinates shown in a drawing are used suitably when expressing a direction and an orientation. Here, the X-axis and Y-axis directions represent the horizontal direction, a...

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PUM

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Abstract

PURPOSE: A substrate processing apparatus and a method for providing processing solution are provided to prevent the fluctuation of process liquid by using a movable pipe supporting part. CONSTITUTION: A substrate holding unit(30) horizontally maintains a substrate(200). A guide unit(42) is extended in a main injection direction. A main injection unit(40) includes a movable part which moves in the main injection direction. A pipe guides process liquid to a discharge unit(50). A movable pipe supporting part(100) is periodically moved according to the movement of the movable part.

Description

technical field [0001] The present invention relates to glass or ceramics for holding semiconductor wafers, glass substrates for liquid crystal display devices, glass substrates for PDP (Plasma Display Panels), glass substrates for organic EL display panels, substrates for solar cells, magnetic disks or optical disks The technology for the stability of the flow rate of the processing liquid coated on various processed substrates such as substrates. Background technique [0002] A conventionally known technique is to apply a pixel forming material such as an organic EL as a coating liquid while scanning the surface of a substrate on which partition walls are arranged with a nozzle. At this time, a flexible pipe is connected to a nozzle for scanning movement, and the coating liquid flowing through the pipe is ejected from the nozzle. [0003] As such a technique, for example, Patent Document 1 discloses a coating device having a guide extending along the main scanning directi...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C03C17/00C04B41/81
CPCB05C11/1005B05D1/26H01L21/02628H01L21/0273
Inventor 大宅宗明高村幸宏相良秀一伊藤隆介
Owner DAINIPPON SCREEN MTG CO LTD