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Gas-water mixing device and gas-water combined supply system

A technology of co-supply and liquid water, applied in the directions of gas and gas/vapor mixing, mixer, mixing method, etc., can solve the problems of difficult to constant temperature, difficult to control water vapor content, unable to ensure stable supply of water vapor, etc., to achieve stable The effect of supply, gas and water stability

Active Publication Date: 2015-06-17
NINGBO INST OF MATERIALS TECH & ENG CHINESE ACADEMY OF SCI
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, it is difficult to maintain a constant dew point temperature in actual use. Generally, the dew point temperature fluctuation difference is as high as 10°C, and the corresponding absolute humidity fluctuation difference representing the water vapor content is greater than 10%, and the higher the dew point temperature, the greater the absolute humidity fluctuation range. The larger the value, the more difficult it is to control the content of water vapor, so that the stable supply of water vapor cannot be guaranteed.

Method used

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  • Gas-water mixing device and gas-water combined supply system
  • Gas-water mixing device and gas-water combined supply system
  • Gas-water mixing device and gas-water combined supply system

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Embodiment Construction

[0032] The embodiment of the present invention provides a gas-water co-supply system, so that the gas-water of the gas-water mixture is relatively stable, thereby realizing a relatively stable supply of water vapor.

[0033] The following will clearly and completely describe the technical solutions in the embodiments of the present invention with reference to the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only some, not all, embodiments of the present invention. Based on the embodiments of the present invention, all other embodiments obtained by persons of ordinary skill in the art without making creative efforts belong to the protection scope of the present invention.

[0034] Please refer to the attached Figure 1-3 , figure 1 Schematic diagram of the structure of the gas-water mixing device of the combined gas-water supply system provided by the embodiment of the present invention; figure 2 The relationship...

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Abstract

The invention provides a gas-water mixing device which comprises a first mixer provided with a first mixing cavity, a first mixing pipe positioned in the first mixer, a liquid water inlet pipe, a gas carrier inlet pipe, a second mixer, and a third mixer communicated with the second mixer and provided with a third mixing cavity, wherein the first mixing pipe extends from the top end of the first mixer to the bottom end of the first mixer; the liquid water inlet pipe and the gas carrier inlet pipe are communicated with the first mixing pipe, and positioned at the top end of the first mixer; and the second mixer comprises at least one second mixing pipe. The gas-water mixing device adopts the first mixer, the second mixer and the third mixer, so that liquid water and a gas carrier are mixed, water vapor and the gas carrier are mixed for three times, a gas-water ratio of a gas-water mixture is relatively stable, and the water vapor is supplied relatively steadily. The invention also provides a gas-water combined supply system.

Description

technical field [0001] The invention relates to the technical field of providing water vapor for hydrogen production, and more specifically relates to a combined gas-water supply system. Background technique [0002] Hydrogen energy is recognized as the most potential energy carrier in the future due to its abundant sources, clean and pollution-free, high energy density, convenient use, and wide application. Hydrogen production by high-temperature electrolysis of water vapor and hydrogen production by steam catalytic reforming are currently the most attractive hydrogen production methods in the world. They all need to mix and transport water vapor and carrier gas to a designated space for hydrogen production. To control the ratio of water vapor and gas carrier within an appropriate range, it is necessary to ensure precise control of the gas-water ratio of the gas-water mixture, thereby ensuring a stable supply of water vapor. [0003] At present, the air-water mixture is ma...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): B01F13/10B01F15/02B01F3/02B01F3/04B01F5/00B01F15/00B01F15/06F22B3/00B01F23/10
Inventor 郑益锋覃朝晖王蔚国王成田吕新颜张庆生牛金奇官万兵
Owner NINGBO INST OF MATERIALS TECH & ENG CHINESE ACADEMY OF SCI