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Multi-gray scale photomask, manufacturing method of multi-gray scale photomask and pattern transfer method

A multi-grayscale and photomask technology, which is applied to microlithography exposure equipment, photoplate-making process on patterned surface, and originals for photomechanical processing, etc., can solve the problem of insufficient shading and impermeable penetration Issues such as light phase cancellation effect

Active Publication Date: 2014-09-10
HOYA CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, the inventors have found through in-depth research that, in the case where the light-shielding portion has transmittance, in the light-shielding portion in areas other than the vicinity of the boundary (that is, away from the border with the adjacent light-transmitting portion and semi-transmitting portion), area), the light-shielding property tends to become insufficient, that is, in the area apart from the above-mentioned boundary in the light-shielding portion, the light passing through the adjacent light-transmitting portion and semi-transmitting portion does not reach, so it cannot be obtained. The phase reversal effect of the transmitted light caused by the phase inversion, and sometimes the transmitted light transmitted through the light-shielding part will actually make the resist film of the processed object photosensitive.

Method used

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  • Multi-gray scale photomask, manufacturing method of multi-gray scale photomask and pattern transfer method
  • Multi-gray scale photomask, manufacturing method of multi-gray scale photomask and pattern transfer method
  • Multi-gray scale photomask, manufacturing method of multi-gray scale photomask and pattern transfer method

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Embodiment approach

[0038] Below, refer to figure 1 and figure 2 One embodiment of the present invention will be described. figure 1 It is a flowchart showing the manufacturing process of the multi-tone photomask 100 of this embodiment, figure 2 It is a plan view of the multi-tone photomask 100 of this embodiment.

[0039] (1) Composition of multi-grayscale photomask

[0040] Such as figure 1 of (d), figure 2 As shown, the multi-grayscale photomask 100 includes: a transparent substrate 10; a prescribed pattern for transfer, which includes an optical film 30 formed on the transparent substrate 10 (in this embodiment, a film having a prescribed transmittance). strong light-shielding film), the light-shielding portion 101 , the semi-transparent portion 103 , and the light-transmitting portion 102 are formed by patterning.

[0041] The transparent substrate 10 is made of, for example, quartz (SiO 2 ) glass, containing SiO 2 、Al 2 o 3 , B 2 o 3 , RO (R is an alkaline earth metal), R 2 ...

Embodiment

[0088] As an example of the present invention, the following shape was obtained by optical simulation (simulation), that is, using a figure 2 (a) The multi-tone photomask 100 of the illustrated transfer pattern, that is, the multi-tone photomask 100 in which the fine transmission pattern 30a is formed approximately in the center of the width of the light-shielding portion 101, is formed on the object to be processed. The positive resist film is exposed to light and developed to form the shape of the resist pattern.

[0089] For the multi-tone photomask 100 used here, a multi-tone photomask whose transmittance of the optical film 30 is 5% (for the line representing the wavelength i) is used. In addition, for the amount of phase shift, a film of 180 degrees for the i-line (157.3 degrees for the g-line, and 167.4 degrees for the h-line) was used. As the applied exposure conditions, conditions of an exposure machine for LCD are applied, and broadband light including i-line, h-li...

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Abstract

PURPOSE: A multi-gray scale photomask is provided to suppress the photosensitivity of a resist film in a region separated from an interference of a transparent part or semitransparent part. CONSTITUTION: A multi-gray scale photomask(100) comprises a transcription pattern a transmittance part(102), a light shielding part(101), and a semitransparent part(103) by patterning an optical film on a transparent substrate and forms resist patterns with different residue values on an object. The optical film 180° shifts phases of representative wavelength in exposed light of the multi-gray scale photomask and has 3-50% transmittancy with regard to the representative wavelength.

Description

technical field [0001] The present invention relates to a transfer photomask for transferring a circuit pattern for an electronic device, etc. to a transfer target body, and particularly relates to a photomask for efficiently manufacturing liquid crystal display devices, organic EL (electroluminescence), etc. A multi-tone photomask for a display device, a manufacturing method thereof, a pattern transfer method using the above-mentioned multi-tone photomask, and a method for manufacturing a thin film transistor. Background technique [0002] Patent Document 1 discloses a grayscale mask configured such that the phase of light transmitted through a light-shielding film is different from the phase of light transmitted through a translucent film within a range of 150° to 210°. [0003] Patent Document 1: Japanese Patent Laid-Open No. 2008-65138 [0004] In the grayscale photomask described in Patent Document 1, the phase of the exposure light transmitted through the light-shield...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G03F1/32G03F7/20H01L21/336
CPCG03F1/26G03F1/29G03F1/32G03F1/34G03F1/36H01L21/0337
Inventor 山口昇
Owner HOYA CORP