Power semiconductor device with antistatic discharge capacity and manufacturing method

A power semiconductor and discharge capability technology, applied in semiconductor/solid-state device manufacturing, semiconductor devices, electric solid-state devices, etc., can solve the problems of complex formation and increase cost, and achieve design flexibility, cost reduction, and improvement of ESD capability. Effect

Inactive Publication Date: 2015-01-07
HANGZHOU SILAN MICROELECTRONICS
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, the formation of these ESD protection components is relatively complicated, and additional masks are required, which increases the cost while improving the ESD capability
[0004] Therefore, it is necessary to propose a new power semiconductor device to solve the problem that the ESD protection component in the prior art needs to add an additional mask to improve the anti-ESD capability, and the relatively complicated problem is formed.

Method used

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  • Power semiconductor device with antistatic discharge capacity and manufacturing method
  • Power semiconductor device with antistatic discharge capacity and manufacturing method
  • Power semiconductor device with antistatic discharge capacity and manufacturing method

Examples

Experimental program
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Effect test

Embodiment 1

[0053] Figure 3 to Figure 5It shows that the present invention provides a power semiconductor device with anti-static discharge capability, and the gate terminal is connected in series with strip resistors to form a circular array layout structure of the gate.

[0054] Such as Figure 3 to Figure 5 As shown, the steps for forming each of the cells 8 are as follows: provide an epitaxial layer (not shown in the figure, please refer to Figure 2A to Figure 2C In the mark 6); form a second-type lightly doped region in the epitaxial layer (not shown in the figure, please refer to Figure 2A to Figure 2C Mark 5 in the above); on the epitaxial layer, a gate dielectric layer is sequentially formed from bottom to top (not shown in the figure, please refer to Figure 2A to Figure 2C Mark 7) and the first polysilicon strip 4; etch the first polysilicon strip 4 and the gate dielectric layer to expose the second-type lightly doped region; in the second-type lightly doped A first type h...

Embodiment 2

[0061] Figure 8 to Figure 9 Shown is the circular array layout structure of the source terminal of the power semiconductor device with anti-static discharge capability of the present invention, which is connected in series with strip resistors to form the source.

[0062] Such as Figure 8 and 9 As shown, the steps for forming each of the cells 8 are as follows: provide an epitaxial layer (not shown in the figure, please refer to Figure 2A to Figure 2C In the mark 6); form a second-type lightly doped region in the epitaxial layer (not shown in the figure, please refer to Figure 2A to Figure 2C Mark 5 in the above); on the epitaxial layer, a gate dielectric layer is sequentially formed from bottom to top (not shown in the figure, please refer to Figure 2A to Figure 2C Mark 7) and the first polysilicon strip 4; etch the first polysilicon strip 4 and the gate dielectric layer to expose the second-type lightly doped region; in the second-type lightly doped A first type hea...

Embodiment 3

[0072] Figure 12 The difference between the illustrated embodiment and the first and second embodiments is to provide a circular array layout structure in which the gate terminal and the source terminal of the power semiconductor device with anti-static discharge capability are simultaneously connected in series with resistors to form the gate and source.

[0073] In this embodiment, the changed embodiment 1 can be combined with the layout structure of embodiment 2 to form Figure 12 . The content of the changes in the first embodiment is as follows: a first port 1' is provided on the second polysilicon strip 4', and a second port 1' is provided on the second polysilicon strip 4' other than the first port 1' The gate 1 is formed, and the second polysilicon strip 4 ′ is a resistor R1 connected to the first port, and the first port 1 ′ has no direct electrical connection with the gate 1 . Then, the size of the resistor R1 connected in series with the gate terminal can be adju...

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PUM

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Abstract

The invention provides a manufacturing method for a power semiconductor device with antistatic discharge capacity. The manufacturing method comprises the following steps of: providing the power semiconductor device with a first port, a second port and a third port, wherein the power semiconductor device is formed by arranging cell arrays; and respectively connecting any one port or more than one port of the three ports to a resistor to form the power semiconductor device with the antistatic discharge capacity. The invention also provides the power semiconductor device with the antistatic discharge capacity. By the power semiconductor device with the antistatic discharge capacity and the manufacturing method, a series resistor of any one port or more than one port of three ports of the power semiconductor device serves as an electrostatic discharge (ESD) protective component to improve the ESD capacity; the series resistor can meet the requirements on a plurality of grades of ESD by slightly adjusting a protected device layout structure; and the design flexibility is high.

Description

technical field [0001] The invention belongs to the technical field of electrostatic discharge of power semiconductor devices, and in particular relates to a power semiconductor device with anti-static discharge capability and a manufacturing method. Background technique [0002] Electrostatic Discharge (ESD) is an important factor that causes damage to most electronic components. In order to avoid damage to electronic components, electronic engineers have thought of many countermeasures. One of the mainstream ideas is to design ESD for a single device or integrated circuit , that is, by adding ESD protection components to protect the devices or integrated circuits that need to be protected. Widely used ESD protection components include diodes (Diode), bipolar transistors (NPN / PNP), metal-oxide-semiconductor field-effect transistors (MOSFETs), silicon-controlled rectifiers (SCRs), and the like. [0003] Edward John Coyne et al. propose an electrostatic protection component ...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01L21/822H01L27/02
Inventor 叶俊张邵华
Owner HANGZHOU SILAN MICROELECTRONICS
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