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Ferromagnetic sputtering target and method for manufacturing same

A manufacturing method and a strong magnetic technology, which is applied in the direction of sputtering coating, sputtering coating, and magnetic layer coating, can solve the problems of powder generation, reduce the generation of powder particles, and suppress abnormal discharge. Effect

Active Publication Date: 2013-05-08
JX NIPPON MINING & METALS CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Moreover, this abnormal discharge causes the problem of particle generation in sputtering

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1）

[0082] In Example 1, as the raw material powder, SiO 2 Powder 95% by weight, SnO 2 Weigh SiO with an average particle size of 1 μm in the form of 5% by weight of powder 2 Powder and SnO with an average particle size of 1 μm 2 powder, using a ball mill to mix for 1 hour to prepare SiO 2 -SnO 2 Mix powder. The target composition is 78Co-12Cr-5Pt-5SiO 2 -0.1SnO 2 (mol %), Co powder 70.56 wt%, Cr powder 9.59 wt%, Pt powder 14.99 wt%, SiO 2 -SnO 2 The mixed powder was weighed at a weight ratio of 4.86% by weight, Co powder with an average particle diameter of 3 μm, Cr powder with an average particle diameter of 5 μm, and Pt powder with an average particle diameter of 3 μm.

[0083] Then, Co powder, Cr powder, Pt powder and SiO 2 -SnO 2 The mixed powder was sealed in a ball mill jar with a capacity of 10 L together with zirconia balls as a grinding medium, and mixed by rotating for 20 hours.

[0084] This mixed powder was filled in a carbon mold, and hot-pressed in a vacu...

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Abstract

A ferromagnetic sputtering target having a composition containing not more than 20 mol% Cr, 5-30 mol% Pt, 5-15 mol% SiO2, and 0.05-0.60 mol% Sn, with Co constituting the balance, the ferromagnetic sputtering target being characterized in that the Sn is contained in SiO2 particles (B) dispersed in a metal base (A). The method yields a ferromagnetic sputtering target containing dispersed nonmagnetic particles. The target can prevent the abnormal electrical discharge of oxides responsible for the generation of particles during sputtering.

Description

technical field [0001] The present invention relates to a ferromagnetic material sputtering target used for forming a magnetic thin film of a magnetic recording medium, especially a magnetic recording layer of a hard disk using a perpendicular magnetic recording method, and relates to an oxide capable of suppressing the generation of particles during sputtering Non-magnetic material particle-dispersed ferromagnetic material sputtering target with abnormal discharge and its manufacturing method. Background technique [0002] There are various types of sputtering apparatuses, but in forming the above-mentioned magnetic recording film, a magnetron sputtering apparatus equipped with a DC power supply is widely used from the viewpoint of high productivity. The principle used in the sputtering method is as follows: a substrate as a positive electrode is opposed to a target as a negative electrode, and a high voltage is applied between the substrate and the target in an inert gas a...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/34G11B5/85
CPCG11B5/851C23C14/3414B22F3/00C22C1/1084C22C32/0026C22C2202/02
Inventor 池田祐希高见英生
Owner JX NIPPON MINING & METALS CORP