Littrow-structure tunable external-cavity laser and mode-hopping-free sweep-frequency regulation method thereof

An adjustment method and laser technology, applied in the field of laser tuning, can solve problems such as the inability to achieve large-scale mode-hop-free tuning, and achieve the effect of large-scale mode-hop-free tuning

Active Publication Date: 2014-12-03
HARBIN INST OF TECH
View PDF2 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0012] The present invention is to solve the problem that the existing Littrow structure external cavity laser cannot realize large-scale non-mode-hopping tuning, and provides a Littrow structure tunable external cavity laser and its mode-hopping-free frequency sweep adjustment method

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Littrow-structure tunable external-cavity laser and mode-hopping-free sweep-frequency regulation method thereof
  • Littrow-structure tunable external-cavity laser and mode-hopping-free sweep-frequency regulation method thereof
  • Littrow-structure tunable external-cavity laser and mode-hopping-free sweep-frequency regulation method thereof

Examples

Experimental program
Comparison scheme
Effect test

specific Embodiment approach 1

[0024] Specific implementation mode one: the following combination figure 1 Describe this embodiment, the Littrow structure tunable external cavity laser described in this embodiment includes a semiconductor laser 1, it also includes a liquid crystal spatial light modulator 2 and a blazed grating 3,

[0025] The laser beam emitted by the semiconductor laser 1 is incident on the blazed grating 3 after passing through the liquid crystal spatial light modulator 2 , and the semiconductor laser 1 and the liquid crystal spatial light modulator 2 are arranged in sequence on the optical axis of the first-order diffraction of the blazed grating 3 .

specific Embodiment approach 2

[0026] Specific implementation mode two: the following combination figure 1 Describe this implementation mode, this implementation mode is based on the Littrow structure tunable external cavity laser described in the first embodiment mode hopping frequency sweep adjustment method,

[0027] The laser beam emitted by the semiconductor laser 1 is incident on the blazed grating 3 after passing through the liquid crystal spatial light modulator 2. Resonance is formed between the cavities, and finally the zero-order output of the blazed grating 3 is emitted;

[0028] Rotate the blazed grating 3 around the axis point O, and change the voltage of the liquid crystal spatial light modulator 2 at the same time so that the refractive index n(θ) of the liquid crystal spatial light modulator 2 is:

[0029] n ( θ ) = 2 dq sin θ - ...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention relates to a Littrow-structure tunable external-cavity laser and a mode-hopping-free sweep-frequency regulation method thereof, belonging to the technical field of laser tuning. The problem that the existing Littrow-structure external-cavity laser cannot realize large-scale mode-hopping-free tuning is solved. The Littrow-structure tunable external-cavity laser comprises a semiconductor laser, a liquid crystal spatial light modulator and a blazed grating. The mode-hopping-free sweep-frequency regulation method comprises the steps that laser beams which are emitted by the semiconductor laser are enabled to pass through the liquid crystal spatial light modulator and then to be incident onto the blazed grating, first-order diffracted light which passes through the blazed grating and returns back along the original path forms resonance between the inner cavity and the outer cavity of the tunable external-cavity laser, and finally the light emerges from the zero order of the blazed grating; and the blazed grating is rotated around an axis point O, the voltage of the liquid crystal spatial light modulator is changed at the same time to change the refractive index of the liquid crystal spatial light modulator and the mode-hopping-free sweep-frequency regulation of the tunable external-cavity laser is realized during tuning by rotating the blazed grating. The mode-hopping-free sweep-frequency regulation method is applicable to the regulation of lasers.

Description

technical field [0001] The invention relates to a tunable external cavity laser with a Littrow structure and a mode-hopping-free sweep frequency adjustment method thereof, belonging to the technical field of laser tuning. Background technique [0002] The Littrow external cavity laser can realize single-mode continuous frequency sweep, and its frequency adjustment is realized by rotating the grating. When an optimal grating rotation axis point is found, the continuous adjustment of the laser without mode hopping can be realized. Its structural diagram is as figure 2 shown. [0003] figure 2 In the process of tuning the laser, the grating rotates around the point O as the axis point. At this time, formula (1) and formula (2) jointly determine the wavelength λ of the laser beam emitted by the external cavity laser: [0004] lambda r =d2sinθ,(1) [0005] λ q = 2 L ...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Patents(China)
IPC IPC(8): H01S5/14H01S5/06
Inventor 刘国栋路程甘雨陈凤东刘炳国庄志涛
Owner HARBIN INST OF TECH
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap