Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Two methods of achieving single-side polishing on double-side polishing machine

A single-side polishing and polishing machine technology, which is applied in the field of polishing, can solve the problems of increasing maintenance costs, use costs, and high equipment investment, and achieve the effect of increasing the number of polishing and improving polishing efficiency

Inactive Publication Date: 2013-06-19
张卫兴
View PDF6 Cites 9 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Therefore, in practical applications, when both single-sided polishing and double-sided polishing are required, it is necessary to purchase a single-sided crystal polishing machine and a double-sided crystal polishing machine, which not only requires high equipment investment, but also increases maintenance. cost and cost of use

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Two methods of achieving single-side polishing on double-side polishing machine
  • Two methods of achieving single-side polishing on double-side polishing machine
  • Two methods of achieving single-side polishing on double-side polishing machine

Examples

Experimental program
Comparison scheme
Effect test

no. 1 example

[0032] 1) On the lower grinding disc 5 of the double-sided polishing machine, install the intermeshing inner ring gear 1, the external tooth sun gear 4 and five planetary discs 2 with external teeth. Each planetary disc 2 has five channels. Hole 3.

[0033] 3) Put 25 pieces of crystal material 7 in the through hole 3, the crystal material 7 is suitable for the size of the through hole.

[0034] 3) Put a buffer pad 9, a fixed layer 10, and a briquetting block 11 on each planetary disc 5 in sequence, and the pressure of the briquetting block is 300g / cm 2 .

[0035] 4) Keep the upper grinding disc out of contact with the lower grinding disc for polishing.

[0036] 5) Polishing conditions: the rotational speed of the lower grinding disc: 16~60rpm, the rotational speed ratio of the external gear sun gear and the lower grinding disc is 1:3~1:10.

[0037] In this embodiment, only the lower grinding disc is used to polish the crystal material, realizing single-sided polishing on a ...

no. 2 example

[0040] 1) On the lower grinding disc 5 of the double-sided polishing machine, install the intermeshing inner ring gear 1, the external tooth sun gear 4 and five planetary discs 2 with external teeth. Each planetary disc 2 has five channels. Hole 3.

[0041] 2) The surfaces of 50 crystal materials 7 that do not need to be polished are bonded in pairs with high-temperature wax, and the size of the crystal materials 7 is adapted to the size of the through hole 3 .

[0042] 3) Put the above-mentioned 25 pairs of crystal materials 7 bonded in pairs into the through holes 3 of the planetary disk 2 .

[0043] 4) Cover the upper grinding disc, and polish the upper and lower grinding discs at the same time;

[0044] 5) Polishing process conditions: lower grinding disc speed: 16~60rpm, upper grinding disc speed: 16~60rpm, external gear sun gear and lower grinding disc speed ratio: 1:3~1:10.

[0045] In this embodiment, the upper and lower grinding discs are polished simultaneously, an...

no. 3 example

[0048] 1) On the lower grinding disc 5 of the double-sided polishing machine, install the intermeshing inner ring gear 1, the external tooth sun gear 4 and five planetary discs 2 with external teeth. Each planetary disc 2 has five channels. Hole 3.

[0049] 2) if image 3 As shown, the surfaces of three smaller crystalline materials 7 that do not need to be polished are stuck on the upper surface of the stainless steel sheet 8 with wax, and the surfaces that do not need to be polished of the other three crystal materials are bonded to the surface of the stainless steel sheet 8 with high-temperature wax. On the lower surface, the size of the stainless steel sheet 8 is compatible with the size of the through hole 3 on the planetary disc 2; repeat the aforementioned operations to obtain 25 pieces of stainless steel sheet 8, each of which is pasted with 6 pieces of crystal material 7.

[0050] 3) Put the above-mentioned 25 pieces of stainless steel sheets 8 in the through holes 3...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
Temperature toleranceaaaaaaaaaa
Login to View More

Abstract

The invention discloses two methods of achieving single-side polishing on a double-side polishing machine. The two methods include a pressure type single-side polishing method of the double-side polishing machine and an adhesion type single-side polishing method of the double-side polishing machine. The pressure type single-side polishing method of the double-side polishing machine mainly includes: arranging pressing blocks on planetary plates, wherein an upper grinding plate and a lower grinding plate are always in a non-contact state, and carrying out polishing. The adhesion type single-side polishing method of the double-side polishing machine mainly includes: adhering surfaces of crystal materials together, wherein the surfaces are needless to be polished, and meanwhile carrying out the polishing on the upper grinding plate and the lower grinding plate. By means of the two methods, the single-side polishing of the crystal materials can be achieved on the double-side polishing machine, a special single-side polishing machine is needless to be purchased, cost is fully saved, and machining efficiency is further improved and industrialization is facilitated.

Description

technical field [0001] The invention relates to two polishing methods realized on double-sided lapping and polishing machines, in particular to two single-sided polishing methods realized on double-sided lapping and polishing machines. Background technique [0002] At present, with the development of modern high technology, crystal materials are more and more widely used in electronics, optics, instrumentation, aerospace and civil industries. Crystal grinding and polishing machines are mainly used for the processing of crystal materials, but in the prior art, the same grinding and polishing machine does not have the function of single-side polishing and double-side polishing at the same time, that is, the double-side polishing machine does not have the function of single-side polishing. Therefore, in practical applications, when both single-sided polishing and double-sided polishing are required, it is necessary to purchase a single-sided crystal polishing machine and a doub...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
IPC IPC(8): B24B29/02
Inventor 张卫兴
Owner 张卫兴
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products