Preparation method of self-assembled three-dimensional hafnium carbide whisker network structure
A three-dimensional hafnium carbide, network structure technology, applied in chemical instruments and methods, from chemical reactive gases, crystal growth and other directions, to achieve the effect of less impurity content
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Embodiment 1
[0026] 1. Configure Ni(NO) with a concentration of 1mol / L 3 ) 2 weak.
[0027] 2. Soak the cleaned 2D carbon felt with a size of 60mm×45mm×10mm in the solution described in step 1 for 2 hours, then take out the carbon felt and dry it in a drying oven at 50°C for later use.
[0028] 3. Chemical vapor deposition (CVD) process to prepare self-assembled three-dimensional HfC whisker network structure, the method is as follows:
[0029] impregnated with Ni(NO 3 ) 2 The 2D needle-punched carbon felt is placed in a graphite mold for deposition in a vertical tubular resistance furnace, vacuumed to about 2kPa, and inert argon is introduced as a protective gas, and the temperature of the furnace is raised at a heating rate of 5°C / min. to 1250°C; when the temperature in the furnace reaches the deposition temperature, H 2 , HfCl 4 and CH 4 gas, control H 2 , HfCl 4 and CH 4 The partial pressures are 0.90, 0.05, 0.05, HfCl 4 The gas flow rate is 115mg / min; the vacuum pumping spe...
Embodiment 2
[0031] 1. Configure NiCl with a concentration of 0.5mol / L 2 weak.
[0032] 2. Soak the cleaned 2D carbon felt with a size of 60mm×45mm×10mm in the solution described in step 1 for 2 hours, then take out the carbon felt and dry it in a drying oven at 50°C for later use.
[0033] 3. Chemical vapor deposition (CVD) process to prepare self-assembled three-dimensional HfC whisker network structure, the method is as follows:
[0034] will be impregnated with NiCl in step 2 2 The 2D needle-punched carbon felt is placed in a graphite mold for deposition in a vertical tubular resistance furnace, vacuumed to about 2kPa, and inert argon is introduced as a protective gas, and the temperature of the furnace is raised at a heating rate of 5°C / min. to 1300°C; when the temperature in the furnace reaches the deposition temperature, H 2 , HfCl 4 and CH 4 gas, control H 2 , HfCl 4 and CH 4 The partial pressures are 0.80, 0.10, 0.10, HfCl 4 The gas flow rate is 150mg / min; the vacuum pump...
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