Photovoltaic cells
A photovoltaic device, conductivity type technology, applied in the field of photovoltaic cells, can solve problems such as low manufacturing cost
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[0016] In some embodiments, as shown in FIG. 1 , on a flexible, supported material such as stainless steel sheet, graphite foil, graphite-coated flexible foil, graphite-coated stainless steel sheet, or other material suitable for roll-to-roll deposition, 1. Depositing a high-purity n-type silicon layer 110 on the removable substrate 105 . The thickness of the high purity n-type silicon layer may range from about 0.01 microns to greater than 100 microns. A release layer 106, such as silicon nitride, may be applied to the flexible substrate prior to depositing the n-type silicon layer on the flexible, supporting, removable substrate. Deposition processes 150 and 154 may be any method or combination of methods including CVD, PVD, MOCVD, PECVD, RF-PECVD, and high purity plasma spraying, among other processes known to those skilled in the art.
[0017] In some embodiments, the deposited n-type silicon layer is then recrystallized to form the light absorbing layer of the solar cell...
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