Three-dimensional evaporation mask with high iron content

A three-dimensional and mask technology, applied in the field of OLED production, can solve the problem that the light-emitting display cannot meet high requirements, and achieve the effects of good opening quality, good coating surface quality and simple process

Inactive Publication Date: 2016-08-10
KUN SHAN POWER STENCIL
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The light-emitting display produced by the planar evaporation mask of the prior art cannot meet the high requirements of the market

Method used

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  • Three-dimensional evaporation mask with high iron content
  • Three-dimensional evaporation mask with high iron content
  • Three-dimensional evaporation mask with high iron content

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0030] Such as Figure 1-3 Said, a three-dimensional three-dimensional evaporation mask plate 1 with high iron content, including a pattern opening 2 in the pattern opening area, has a three-dimensional structure 3, and the three-dimensional structure 3 is composed of a recessed area 22 and a raised area 11. The recessed area 22 is a recessed structure lower than the surface of the mask plate, and the raised area 11 is a raised structure higher than the surface of the mask plate. The material of the mask 1 includes iron and nickel, the iron content is 56%, and the nickel content is 44%. The depth of the depressed region 22 is ≤10 μm, and the height of the raised region 11 is ≤10 μm. The angle α formed between the recessed area 22 and the surface of the mask 1 is 90° 0 , the angle β formed between the raised area 11 and the surface of the mask 1 is 90° 0 . The thickness of the mask is 100 μm, and the uniformity COV of the mask is less than 5%; the surface brightness of the ...

Embodiment 2

[0032] A three-dimensional evaporation mask with high iron content, comprising a pattern opening in a pattern opening area, having a three-dimensional structure, the three-dimensional structure is composed of a concave area and a raised area, and the concave area is lower than the surface of the mask plate The concave structure, the convex structure of which the raised area is higher than the surface of the mask template. The material of the mask includes iron and nickel, the iron content is 60%, and the nickel content is 40%. The depth of the depressed region is ≤1 μm, and the height of the raised region is ≤1 μm. The range of the included angle formed between the recessed area and the mask plate surface is 80° 0 , the angle between the raised area and the mask plate surface is 80° 0 . The thickness of the mask is 20 μm, and the uniformity COV of the mask is less than 5%; the surface brightness of the mask is first-class brightness. When in use, one side of the evaporatio...

Embodiment 3

[0034] A three-dimensional evaporation mask with high iron content, comprising a pattern opening in a pattern opening area, having a three-dimensional structure, the three-dimensional structure is composed of a concave area and a raised area, and the concave area is lower than the surface of the mask plate The concave structure, the convex structure of which the raised area is higher than the surface of the mask template. The material of the mask includes iron and nickel, the iron content is 62%, and the nickel content is 38%. The depth of the depressed region is ≤10 μm, and the height of the raised region is ≤10 μm. The range of the included angle formed between the recessed area and the mask plate surface is 85° 0 , the range of the included angle formed between the raised area and the mask plate surface is 85 0 . The thickness of the mask is 60 μm, and the uniformity COV of the mask is less than 5%; the surface brightness of the mask is first-class brightness. When in u...

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Abstract

The invention relates to a three-dimensional evaporation mask with high iron content, which includes a graphic opening area, and is characterized in that it has a three-dimensional structure, and the three-dimensional structure is composed of a concave area and a raised area, and the concave area is a ratio mask. A concave structure with a lower surface of the template plate, and a raised structure in which the raised area is higher than the surface of the mask plate; the material of the mask plate includes two elements of iron and nickel; the content of the iron element is 56% to 62% , the content of the nickel element is 38% to 44%. The three-dimensional vapor deposition mask plate with high iron content provided by the present invention has a concave area and a raised area, including two elements of iron and nickel, the board surface has good brightness, the coating surface quality is good, and there are no pits, pinholes, and protrusions The area is not easy to fall off, the cost is low, the process is simple, energy saving, high opening precision, good opening quality, smooth hole wall, and has broad market prospects.

Description

technical field [0001] The invention relates to a three-dimensional evaporation mask, which belongs to the field of OLED production. Background technique [0002] OLED, that is, organic light-emitting diode, also known as organic electro-laser display. OLED display technology is different from the traditional LED display method. It does not need a backlight. It uses a very thin coating of organic materials and a glass base layer. When an electric current passes through, these organic materials will emit light. Moreover, the OLED display screen can be made lighter and thinner, has a larger viewing angle, and can significantly save power. The excellent performance of OLED makes its accessory—mask board get unprecedented development space. Usually, in the manufacture of light-emitting displays, masks are used to deposit layers with predetermined patterns, that is, when depositing layers such as organic layers, using a mask with specific patterns of holes, a pattern with corre...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C23C14/04C22C38/08
Inventor 魏志凌高小平
Owner KUN SHAN POWER STENCIL
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