A film transfer system of a plasma etching machine
A plasma and etching machine technology, applied in the field of film transfer system, can solve the problems of low degree of automation and small disk throughput, and achieve the effect of high degree of automation, high production efficiency, and adapting to the needs of large-scale industrial production
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[0024] A film transfer system of a plasma etching machine, consisting of a loading device and a manipulator device;
[0025] The loading device includes a loading chamber 1 and a chamber cover 1A, a sealing ring is provided between the loading chamber 1 and the chamber cover 1A, a side of the loading chamber 1 is provided with a feeding port, and a plug valve 3 is provided at the feeding port; The loading cavity 1 is connected with the vacuum mechanical pump and the external air source;
[0026] The manipulator device includes a manipulator 2 and a housing chamber 21 of the manipulator 2, the housing chamber 21 communicates with the loading chamber 1 through the flapper valve 3, and the manipulator 2 enters the loading chamber 1 through the feeding port;
[0027] The inside of the loading cavity 1 is provided with a tray rack 4 for supporting the discs. The tray rack 4 has a plurality of supporting positions 41 for supporting the discs. Each supporting position 41 is provided ...
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