Film spool conveying system of plasma etcher

Abstract

The invention discloses a film spool conveying system of a plasma etcher, which comprises a loading device and a manipulator device, wherein the loading device comprises a loading cavity body and a cavity cover; a seal ring is arranged between the loading cavity body and the cavity cover; the loading cavity body is provided with a film spool taking and sending port; a gate valve is arranged at the film spool taking and sending port; the loading cavity body is connected with a vacuum mechanical pump and an external air source; the manipulator device comprises a manipulator and a containing cavity; the containing cavity is communicated with the loading cavity body through the gate valve; the loading cavity body is internally provided with a tray frame; the tray frame is provided with a plurality of support positions; each support position is provided with a notch; the tray frame is fixed on a bottom frame; the bottom frame is connected with a lifting rotary device; the lifting rotary device comprises a lifting working part and a rotary working part; the lifting working part comprises a guide rod, a lifting motor and a lifting transmission mechanism; the rotary working part comprises a rotary motor and a rotary transmission mechanism; and the guide rod is in gap sealing with the cavity body. The film spool conveying system has the advantages that the throughput of a film spool is increased, and the automation degree is high.

Description

technical field [0001] The invention relates to the technical field of plasma etching, in particular to a film transfer system of a plasma etching machine. Background technique [0002] Plasma etching is the most common form of dry etching. Its principle is that the gas exposed to the electron area forms a plasma, and the resulting ionized gas and gas composed of released high-energy electrons form a plasma or ion , when the ionized gas atoms are accelerated through an electric field, they release enough force with surface repelling forces to tightly bond materials or etch surfaces. [0003] The film transfer system is an important part of the plasma etching machine. When it functions, the film to be etched is sent into the etching chamber, and the film is taken out after the etching is completed. The film transfer system of the existing plasma etching machine can only be installed on one disc at a time, the throughput of the disc is small, the degree of automation is low, ...

AI Technical Summary

Problems solved by technology

[0004] In order to overcome the disadvantages of low disk throughput and low degree of automation of the prior art film transfer system, the present invention provides a film transfer system of a plasma etching machine with increased film throughput and a high degree of automation

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