Auxiliary support device, support device and auxiliary support method
A technology of auxiliary support and support device, applied in vibration suppression adjustment, spring/shock absorber, mechanical equipment, etc., can solve the problems of static position offset of steel spring, high cost, increase use cost, etc., achieve fast response speed, The effect of reducing heat generation and simple structure
Active Publication Date: 2016-11-23
SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD +1
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Problems solved by technology
However, this method has the following disadvantages: the change in the mass of the micro-motion table will cause the steel spring to produce a static position offset; in order to maintain the position stability of the micro-motion table, the stiffness of the steel spring is relatively large, and the vibration of the base is easily transmitted. to the micro-motion stage; the steel spring has no damping and is easy to excite resonance
The disadvantages of this method are: the design of the air flotation structure is very complicated; the air flotation structure will discharge gas to the environment and cannot be used in a vacuum environment; the air flotation structure is very sensitive to the particle pollution of the gas, and a particle filter device is required to eliminate particle pollution. Increased use cost; the processing of internal pipes and small holes of the air flotation structure is complicated and costly
Method used
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[0041] In order to better understand the technical content of the present invention, specific embodiments are given together with the attached drawings for description as follows.
[0042] Please see figure 1 , figure 1 Shown is a schematic cross-sectional view of the structure of the supporting device in a preferred embodiment of the present invention.
[0043] The auxiliary supporting device is applied to the supporting device 1 to assist in supporting the micro-movement stage of the photolithography machine (not shown in the figure).
[0044] The support device 1 includes a support plate 101 , a base 107 and a Lorentz motor 10 . The support plate 101 is fixedly connected to the micro-motion table. The Lorentz motor 10 is fixed on the base 107 and supports the support plate 101 .
[0045] Lorentz motor 10 is fixed to mover 104 and stator 103 . In one embodiment, the mover 104 is fixed on the base 107 , and the stator 103 is fixed on the support plate 101 . In other emb...
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The invention provides an auxiliary supporting device applied to a supporting device for a photoetching machine. The supporting device comprises a supporting plate, a base and a Lorentz motor. The motor is fixed on the base and supports the supporting plate. The auxiliary supporting device comprises a membrane, a gas source and a control valve, the membrane is connected to the base, forms a gas chamber with the base and is used for bearing the supporting plate, the gas source is used for supplying gas to the gas chamber, and the control valve is arranged between a vent hole of the gas chamber and the gas source and used for regulating gas pressure of the gas chamber. The Lorentz motor is utilized while the movable membrane is utilized to bear the supporting plate, pressure of the gas chamber is controlled pneumatically, the supporting plate is driven at low frequency, and heat emission is quite low.
Description
technical field [0001] The present invention relates to a supporting device, and in particular to an auxiliary supporting device of a photolithography machine, and an auxiliary supporting method is also proposed. Background technique [0002] In the lithography machine, the micro-motion stage of the workpiece stage and the mask stage is supported by a low-rigidity gravity compensator, which can avoid severe heat caused by motor support. [0003] In the current technology, there are the following two methods: [0004] One is to use steel springs to support the micro-motion stage. However, this method has the following disadvantages: the change in the mass of the micro-motion table will cause the steel spring to produce a static position offset; in order to maintain the position stability of the micro-motion table, the stiffness of the steel spring is relatively large, and the vibration of the base is easily transmitted. to the micro-motion stage; the steel spring has no dam...
Claims
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IPC IPC(8): F16F15/023
Inventor 廖飞红李小平朱岳彬秦磊
Owner SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD