Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

High-ridge ridge side double-row film-covered drip irrigation planting method and special seeder

A planting method and seeder technology, applied in the fields of soil preparation methods, applications, agricultural machinery and implements, etc., can solve the problems affecting the growth and development of potatoes, unfavorable expansion of potato seed buds, and easy air-drying of the soil, so as to save power and fuel consumption, Save the amount of mulch film, and the effect of ridge lighting is good

Active Publication Date: 2016-07-06
呼和浩特市得利新农机制造有限责任公司
View PDF7 Cites 1 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Using traditional ridge sowing, the soil is easy to dry out and lose moisture, which is not conducive to the expansion of potato seed buds and affects the growth and development of potatoes

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • High-ridge ridge side double-row film-covered drip irrigation planting method and special seeder
  • High-ridge ridge side double-row film-covered drip irrigation planting method and special seeder
  • High-ridge ridge side double-row film-covered drip irrigation planting method and special seeder

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0026] A method for planting potatoes with film-covered drip irrigation in double rows on high ridges and ridges, which includes planting techniques such as soil preparation before plowing, mechanical ridging, side seeding, ridge shaping, drip irrigation under plastic film, and plastic film covering.

[0027] Land preparation before plowing is to use mechanical deep plowing operations, with a plowing depth of 300-350mm, breaking the current plow bottom layer formed by years of shallow plowing, and creating fertile soil and loose seed beds. At the same time, rake in time to crush the soil and lay a good foundation for sowing.

[0028] The mechanical ridging is based on agronomic requirements, using a potato ridging film-covered planter to form a trapezoidal soil layer with a ridge top width of 200 mm, a ridge bottom width of 800 mm, and a height of 150-200 mm. The soil porosity of the ridge layer is Large, loose soil, not easy to harden, which is conducive to promoting the deve...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention relates to an agricultural planting method and a special seeder thereof, in particular to a double-row film-covered drip irrigation planting method on high ridges and ridges, including land preparation before plowing, mechanical ridge raising, ridge side sowing, ridge shaping, drip irrigation under film, Planting technologies such as mulching film, which organically combine the advanced planting technologies of individual dry farming, have explored a new water-saving irrigation technology that combines ridge farming micro-concentration planting technology with film mulching and drip irrigation technology. The extension and deepening of cover cultivation technology. It is characterized by the early emergence of potatoes, which can prolong the growth period and significantly improve the yield characteristics of potatoes. It can also be directly covered with soil above the seed potatoes to press the plastic film. The potatoes can break through the plastic film and emerge without manual seedlings.

Description

Technical field: [0001] The invention relates to a new agricultural planting method, in particular to a film-covered drip-irrigation planting method with double rows on the sides of high ridges and a special seeder thereof. Background technique [0002] With the development of market economy, my country's potato planting area and production generally show an increasing trend. Potato planting areas in my country are mainly distributed in the one-season farming areas in the north, which is an alpine and arid area. Its salient features are drought, little rain, and lack of water resources. There are nine droughts in ten years of agriculture, and the frost-free period is short, and the temperature rises slowly in early spring. In addition, the potato sowing period is late and the growth period is short, which has a great impact on the yield. Therefore, improving the utilization efficiency of natural precipitation is the fundamental way for stable and high-yield crops in dry are...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Patents(China)
IPC IPC(8): A01B79/02A01B49/06
Inventor 路战远杨彬程玉臣张向前张建中咸丰白海妥德宝赵沛义刘孝忱张德健田玉花杨少楠智颖飙张荷亮王玉芬孙鸿举张富荣郭晓霞
Owner 呼和浩特市得利新农机制造有限责任公司
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com