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Dry etching equipment and etching method

A dry etching and equipment technology, applied in the directions of light guides, optics, instruments, etc., can solve the problems of difficult cleaning of the film layer, wear of the edge of the tray, etc., and achieve the effect of reducing engineering costs and prolonging service life.

Inactive Publication Date: 2016-08-17
SUNBLENCE TECH +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, in the existing groove design, the film layer growing on the edge of the groove is not easy to clean, and it will also cause wear to the edge of the tray during cleaning

Method used

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  • Dry etching equipment and etching method
  • Dry etching equipment and etching method
  • Dry etching equipment and etching method

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Embodiment Construction

[0027] In order to have a clearer understanding of the technical features, purposes and effects of the present invention, the specific implementation manners of the present invention will now be described in detail with reference to the accompanying drawings.

[0028] figure 1 It shows the dry etching equipment in a preferred embodiment of the present invention, which can be applied to the etching process of planar optical waveguide chips in optical communication technology. The dry etching equipment comprises a tray 1 for placing at least one object to be etched 3, an etching unit for etching at least one object to be etched 3, a housing for accommodating the tray 1, and a housing associated with the housing. The connected vacuum generator, at least one set of limit pins 2 that define the position of at least one etched part 3 is installed on the tray 1 . In the dry etching equipment, when the etched part 3 is etched, the position of the etched part 3 is limited by the limit...

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Abstract

The invention discloses a dry etching equipment and an etching method, and relates to the technical field of etching equipment. The dry etching equipment of the present invention includes a tray for placing at least one object to be etched, an etching unit for etching the at least one object to be etched, a housing for accommodating the tray, and the same as shown The housing is connected to a vacuum generator, and at least one set of limit pins for limiting the position of the at least one etched piece is installed on the tray. Since the tray in the dry etching equipment of the present invention uses the limit pin to limit the etched parts, the service life of the tray is extended; and the defect that the tray groove needs to be reprocessed in the traditional method is eliminated, reducing the engineering cost. cost.

Description

technical field [0001] The present invention relates to the technical field of etching equipment, more specifically, to a dry etching equipment and an etching method. Background technique [0002] Dry etching is an important process step in the fields of optical communication, microelectronics, semiconductor lighting, micro-electromechanical systems, and photovoltaic industry. Taking optical communication as an example, the development of my country's broadband access and fiber-to-the-home in recent years has sharply increased the demand for planar optical waveguide chip products. Planar optical waveguide is a technology of fabricating optical waveguides on a planar substrate, and it is an effective means to realize large-capacity optical communication and integration of optical devices. Planar waveguides can be made into arrayed waveguide gratings, optical splitters, multi-channel adjustable optical attenuators, optical switches and other optical devices. In the middle of...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01J37/32G02B6/136
Inventor 赵超超徐跃鸿石建东
Owner SUNBLENCE TECH