Vacuum suction disk anti-blocking system in wet processing equipment
A vacuum suction cup, wet processing technology, applied in electrical components, semiconductor/solid-state device manufacturing, circuits, etc., can solve the problem of unable to reliably adsorb wet wafers, and achieve the effect of reliable adsorption
Active Publication Date: 2014-01-15
THE 45TH RES INST OF CETC
View PDF3 Cites 9 Cited by
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
[0003] The purpose of the present invention is to overcome the above-mentioned deficiencies in the prior art and provide a vacuum chuck anti-clogging system in wet processing equipment, aiming at solving the problem that the existing vacuum chuck can only absorb dry wafers and cannot reliably absorb chemical stains. Fluid Wet Wafer Technical Issues
Method used
the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View moreImage
Smart Image Click on the blue labels to locate them in the text.
Smart ImageViewing Examples
Examples
Experimental program
Comparison scheme
Effect test
Embodiment Construction
[0014] Below, the substantive features and advantages of the present invention will be further described in conjunction with examples, but the present invention is not limited to the listed examples.
[0015] see figure 1 As shown, the figure shows the structure of a vacuum suction cup anti-clogging system in a wet processing equipment provided by an embodiment of the present invention. For ease of description, only parts related to the embodiments of the present invention are shown.
[0016] see figure 1 , a vacuum suction cup anti-clogging system in wet processing equipment, comprising a vacuum suction cup 6, an air source 1, and a pipeline unit connecting the vacuum suction cup 6 and the gas source 1; the pipeline unit is divided into a vacuum negative pressure generating unit and the vacuum pipeline cleaning unit; the vacuum pipeline is equipped with a pressure sensor 5 for detecting the gas pressure of the vacuum pipeline; also includes:
[0017] A controller (not show...
the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More PUM
Login to View More Abstract
The invention relates to a vacuum suction disk anti-blocking system in wet processing equipment. The vacuum suction disk anti-blocking system comprises a vacuum suction disk, an air source and a pipeline unit connected with the vacuum suction disk and the air source. The pipeline unit is divided into a vacuum negative pressure generating unit and a vacuum pipeline sweeping unit. A pressure sensor used for detecting the air pressure of a vacuum pipeline is installed on the vacuum pipeline. The vacuum suction disk anti-blocking system further comprises a controller used for controlling the vacuum negative pressure generating unit to execute the function of enabling negative pressure to be generated inside the vacuum pipeline connected with the vacuum suction disk. The air pressure value inside the vacuum pipeline is detected through the pressure sensor. When the detected air pressure value is lower than a set value, the vacuum pipeline sweeping unit is controlled to execute the function of leading in compressed air so as to conduct sweeping on the vacuum pipeline. According to the vacuum suction disk anti-blocking system in the wet processing equipment, the compressed air is led in so as to conduct sweeping on the vacuum pipeline so that the vacuum pipeline cannot be blocked. Thus, dry wafers can be adsorbed and wet wafers with chemical liquid can also be adsorbed reliably.
Description
technical field [0001] The invention relates to an anti-clogging system of a vacuum sucker in wet processing equipment. Background technique [0002] In semiconductor wet processing equipment, wafers are often adsorbed by vacuum chucks, for example, mechanical grippers for transferring wafers and wafer holders for rotating wafers. Traditional vacuum chucks can only absorb dry wafers, but cannot absorb wet wafers stained with chemical fluids. Otherwise, the chemical fluids will block the vacuum pipes of the chucks, causing the vacuum degree of the chucks to drop, making it impossible to reliably adsorb wafers. Contents of the invention [0003] The purpose of the present invention is to overcome the above-mentioned deficiencies in the prior art and provide a vacuum chuck anti-clogging system in wet processing equipment, aiming at solving the problem that the existing vacuum chuck can only absorb dry wafers and cannot reliably absorb chemical stains. Fluid wet wafer technic...
Claims
the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More Application Information
Patent Timeline
Login to View More IPC IPC(8): H01L21/67H01L21/683
CPCH01L21/6838
Inventor 宋文超陈仲武宫晨张伟锋于静
Owner THE 45TH RES INST OF CETC