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Specific HMX (cyclotetramethylene tetranitramine)

A kind of octogen and special technology, applied in the field of special octogen, it can solve the problems that the crystal surface is not smooth enough, not suitable for particle size grading, wide particle size distribution, etc., to achieve large particle size, high product yield, crystal surface smooth effect

Active Publication Date: 2014-01-22
SHANXI BEIHUA GUANLYU CHEM IND
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] The present invention provides a special Octojin product to solve the technical problems such as wide particle

Method used

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  • Specific HMX (cyclotetramethylene tetranitramine)
  • Specific HMX (cyclotetramethylene tetranitramine)
  • Specific HMX (cyclotetramethylene tetranitramine)

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0015] Example 1 A special Octogen was prepared by the following steps: (a) Dissolving Octogen in dimethyl sulfoxide at 58°C to make Octogen solution, Octogen The mass ratio of octogen to dimethyl sulfoxide is 1:1.3; (b) in the range of 64°C, add three kinds of dimethyl sulfoxide aqueous solutions with different concentrations at a uniform speed in order to dilute and crystallize the octogen solution; the first The concentration of the first dimethyl sulfoxide aqueous solution is 71%, and the adding rate is 0.8 kg / min; the concentration of the second dimethyl sulfoxide aqueous solution is 47%, and the adding rate is 0.9 kg / min; the third dimethyl sulfoxide The concentration of the sulfoxide aqueous solution was 38%, and the addition rate was 1.0 kg / min; after the addition of the three dimethyl sulfoxide aqueous solutions, a sufficient amount of water was added at a uniform speed, and the addition rate was 1.2 kg / min; The addition of sulfone aqueous solution is successively 0.5...

Embodiment 2

[0016] Example 2 A special Octogen was prepared by the following steps: (a) Dissolving Octogen in dimethyl sulfoxide at 40°C to make an Octogen solution, Octogen The mass ratio of octogen to dimethyl sulfoxide is 1:1.2; (b) within the range of 70°C, add three kinds of dimethyl sulfoxide aqueous solutions with different concentrations at a uniform speed in turn to dilute and crystallize the octogen solution; the first The concentration of the first dimethyl sulfoxide aqueous solution is 61%, and the adding rate is 0.9 kg / min; the concentration of the second dimethyl sulfoxide aqueous solution is 45%, and the adding rate is 1.2 kg / min; the third dimethyl sulfoxide The concentration of the sulfoxide aqueous solution was 28%, and the addition rate was 1.0 kg / min; after the addition of the three dimethyl sulfoxide aqueous solutions, a sufficient amount of water was added at a uniform speed, and the addition rate was 1.4 kg / min; The addition of sulfone aqueous solution is successive...

Embodiment 3

[0017] Example 3 A special Octogen was prepared by the following steps: (a) Dissolving Octogen in dimethyl sulfoxide at 49°C to make Octogen solution, Octogen The mass ratio of octogen to dimethyl sulfoxide is 1:1.5; (b) in the range of 82°C, add three kinds of dimethyl sulfoxide aqueous solutions with different concentrations in sequence to dilute and crystallize the octogen solution; the first The concentration of the first dimethyl sulfoxide aqueous solution is 63%, and the adding rate is 1.0 kg / min; the concentration of the second dimethyl sulfoxide aqueous solution is 53%, and the adding rate is 1.1 kg / min; the third dimethyl sulfoxide The concentration of the sulfoxide aqueous solution was 30%, and the addition rate was 1.2 kg / min; after the addition of the three dimethyl sulfoxide aqueous solutions, a sufficient amount of water was added at a uniform speed, and the addition rate was 1.6 kg / min; The addition of sulfone aqueous solution is successively 0.49 times, 0.97 ti...

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Abstract

The invention relates to the field of explosives, in particular to a specific HMX, and solves the technical problems that a conventional HMX product has wide grain fineness distribution, unsmooth crystal plane and lower desensitization performance, and is not suitable for grain size distribution and the like. The specific HMX is prepared by the following steps: (a), HMX is dissolved by dimethyl sulfoxide at the temperature ranging from 40 DEG C to 85 DEG C to prepare an HMX solution; (b), three types of dimethyl sulfoxide aqueous solutions with different concentrations are sequentially added at the constant speed to dilute and crystalize the HMX solution; sufficient water is added at the constant speed after the dimethyl sulfoxide aqueous solutions are added; the sufficient water means that water is added until no new HMX is crystalized out; and (c), the crystalized solution is filtered and washed to obtain the specific HMX. The produced HMX is large in grain size of the product and narrow in distribution, and has smooth crystal plane and no obvious corner angle, an axial ratio is smaller than 1.5, and performance of charge density, brisance and the like are effectively improved.

Description

technical field [0001] The invention relates to the field of explosives, in particular to a special Octogen. Background technique [0002] Octogen is a strong explosive, which is a homologue with Hessogen, and has four crystal forms of α, β, γ, and δ, and the β crystal form that is stable at room temperature is used in practice. The heat resistance of Octogen is higher than that of RDX, and it is widely used in the field of civilian explosives. Octojin is insoluble in water, but soluble in dimethyl sulfoxide. Currently commonly used Octogen has a very dispersed particle size distribution, and the crystal surface is not smooth enough, so it is not suitable for particle size gradation, has low insensitivity, low bulk density, and defects on the surface and inside, which are harmful to the charging process and charging process. Density, mixed explosive sensitivity, and explosive power are all affected. Therefore, an Octogen with large particle size, narrow particle size distr...

Claims

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Application Information

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IPC IPC(8): C07D257/02
CPCC07D257/02
Inventor 姚新民刘小社贾宏选赵荣霞刘波毋文莉卫涌
Owner SHANXI BEIHUA GUANLYU CHEM IND
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