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Array substrate, manufacturing method thereof, and display device

A technology of an array substrate and a manufacturing method, applied in the display field, can solve the problems of complex manufacturing process of the array substrate, and achieve the effect of reducing the manufacturing process steps and reducing the manufacturing cost

Active Publication Date: 2016-01-06
BOE TECH GRP CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0004] The technical problem to be solved by the present invention is the complicated manufacturing process of the existing array substrate

Method used

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  • Array substrate, manufacturing method thereof, and display device
  • Array substrate, manufacturing method thereof, and display device
  • Array substrate, manufacturing method thereof, and display device

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Embodiment Construction

[0022] Embodiments of the present invention will be described in detail below with reference to the accompanying drawings.

[0023] figure 1 A general flowchart of a method for manufacturing an array substrate according to an embodiment of the present invention is shown. Such as figure 1 As shown, the array substrate manufacturing method according to the embodiment of the present invention uses a total of three masking processes, which is three less masking processes than the existing six masking processes required for manufacturing twisted nematic array substrates, and greatly reduces the array substrate. The manufacturing process steps reduce the manufacturing cost of the array substrate.

[0024] The manufacturing method of the array substrate according to the embodiment of the present invention includes:

[0025] The first masking process P1, the first masking process P1 is used to form the source, drain, active layer and pixel electrode of the thin film transistor in t...

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Abstract

A method for manufacturing an array substrate. The method for manufacturing the array substrate comprises three masking processes, among which, the first masking process is used for forming a source electrode (6), a drain electrode (7), an active layer (8), and a pixel electrode (5) of a thin-film transistor in the array substrate, where the active layer (8) and the pixel electrode (5) are arranged in a same layer above the substrate (1), and the source electrode (6) and the drain electrode (7) are located above the active layer (8). Also provided are an array substrate and a display device.

Description

technical field [0001] The present invention relates to the field of display technology, in particular to an array substrate, a manufacturing method thereof, and a display device. Background technique [0002] Due to the advantages of small size, low power consumption, and low radiation, liquid crystal display devices are widely used in equipment such as televisions, monitors, notebook computers, and tablet computers. [0003] At present, when manufacturing a twisted nematic (TN, TwistedNematic) type array substrate, it is usually necessary to carry out six masking processes, which are the gate electrode, the gate insulating layer, the etch stop layer, the source and drain metal layer, the passivation layer and the pixel. The electrode layer is patterned. For each masking process, it is necessary to manufacture a mask plate with high cost, and also need to perform process steps such as exposure, development, etching, ashing, etc., so that the manufacturing process of the ex...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01L21/77H01L27/12G03F7/00
CPCH01L27/1288
Inventor 崔承镇金熙哲宋泳锡刘圣烈
Owner BOE TECH GRP CO LTD