Remote Magnetic Mirror Field Confined Linear Plasma Enhanced Chemical Vapor Deposition System

Abstract

The invention discloses a linear plasma-enhanced chemical vapor deposition system with a remote magnetic-mirror field constraint. The linear plasma-enhanced chemical vapor deposition system comprises a deposition chamber, wherein the deposition chamber is divided into a plasma generation region and a material surface treatment region; a permanent magnet is arranged at each of the top end and two sides of the deposition chamber; upper and lower gas inlet pipes and a coaxial circular waveguide connected with a coaxial microwave source are arranged inside the plasma generation region of the deposition chamber; a substrate table is arranged inside the material surface treatment region of the deposition chamber; a vacuum unit is arranged at the bottom of the deposition chamber; the coaxial circular waveguide is utilized to stimulate a working gas to generate linear microwave plasma inside the deposition chamber under the condition of the linear magnetic-mirror field constraint generated by permanent magnet components; and the introduced working gas forms a film on the substrate surface of the substrate table under the effect of the linear microwave plasma. By adopting the linear plasma-enhanced chemical vapor deposition system, the large-size uniform deposition of a semiconductor film and a doped semiconductor film can be realized, fast and continuous deposition of the film is realized by remotely introducing a reaction gas, and industrial continuous production is easily realized.

Description

technical field [0001] The invention belongs to the scientific research field of plasma and thin film materials, and in particular relates to a remote magnetic mirror-constrained linear plasma-enhanced chemical vapor deposition system. Background technique [0002] Low-temperature plasma-enhanced chemical vapor deposition technology (PlasmaEnhancedChemicalVaporDeposition, PECVD) in large-scale integrated circuits, solar thin-film photovoltaic cells, flat panel displays, material surface modification, functional group grafting and fuel cell ion exchange membranes and other fields of rapid development, There is an urgent need for a low-temperature plasma generation technology that can produce high deposition / etch rates, large-area uniformity, and stability. In order to achieve a breakthrough in this technology, experts in the plasma industry at home and abroad have made unremitting efforts and adopted many methods: First, use more superior plasma discharge excitation sources, ...

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Problems solved by technology

This structure greatly reduces the development difficulty of high-performance plasma deposition thin film equipment, but there is a skin effect when depositing certain semiconductors or doped semiconductors, which is not conducive to the continuous operation of the coating

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