Resist stripper regeneration methods and devices

A regeneration device and resist technology, applied in the direction of separation methods, chemical instruments and methods, evaporator accessories, etc., can solve the problems of not being practical, not cheap, costly, etc., and achieve the effect of preventing temperature drop

Active Publication Date: 2014-04-16
NIPPON REFINE +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0004] These solvents are used in large quantities and are by no means cheap
In addition, from the viewpoint of recycling, it is the most effective method to separate and recycle the individual solvent components, but in terms of cost, it is not practical to separate and refine individual solvent components so that they can be reused. method
Usually, the used resist stripping solution is often used as a combustion aid, but it may contain moisture, so it is costly to decompose it by burning it in order to use it in large quantities

Method used

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  • Resist stripper regeneration methods and devices
  • Resist stripper regeneration methods and devices
  • Resist stripper regeneration methods and devices

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Embodiment Construction

[0056] The method and apparatus for regenerating the resist stripping solution of the present invention will be described below using the drawings. In addition, the following description is just description of one embodiment of this invention, It is not limited to the following description, It can change in the range which does not deviate from the summary of this invention.

[0057] first, figure 1The outline of the regeneration apparatus 1 of the resist stripping solution of the present invention is shown in . The regenerating device 1 of the present invention includes: a pipe LX that transfers the used resist stripping solution from a recovery tank 50 that stores the used resist stripping solution; a separation device 10 that discharges the used resist stripping solution Resist concentrated liquid, resist stripping regeneration liquid, waste liquid A mainly composed of water, and waste liquid B. In addition, the separation device 10 includes a low-boiling point separator...

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Abstract

Provided are resist stripper regeneration methods and devices. Resist components are solid organic matters at normal temperatures and are solidified for adhesion when the temperatures on the periphery of the inlet and outlet of a residue concentrator drops. The regeneration methods for regenerating a resist stripper include a step of low boiling point separation to separate low boiling point substances such as water; a step of high boiling point separation to take out a residual liquid including a resist and a solvent as outliers; a residue concentration process, in which the residual liquid including a resist is further concentrated in the residue concentrator to separate the solvent and to return to the high boiling point separation step; a refining process, in which the separated substances in the high boiling point separation step gasifies and separates the water, the residual part being used as a waste liquid B, and the separated residual liquid is taken out as a stripping regeneration liquid; and a cleaning process, in which the separation residual liquid in the low boiling point separation step flows in the residue concentrator.

Description

technical field [0001] The present invention relates to a regeneration method for separating solvent components from used resist stripping liquid and regenerating the used resist stripping liquid, in particular to a method for concentrating resist-containing liquid from a high boiling point separator. A method and apparatus for regenerating a resist stripping liquid that is less prone to deposits in the residue concentrator and piping of the residual liquid. Background technique [0002] Photolithography is often used in the manufacture of semiconductors, liquid crystal displays, and organic and inorganic EL displays. Here, a thin film of material is formed on a substrate, on which a pattern is formed with a resist. Next, etching is performed along this resist pattern to form a material thin film into a desired pattern. Next, the last remaining resist is stripped. [0003] The resist is a photosensitive resin material, and for example, a novolak resin or the like can be u...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B01D1/00B01D1/22B01D1/30G03F7/42
Inventor 大野顺也川瀬龙洋井上恭井城大世小林繁増田义登
Owner NIPPON REFINE
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