Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Multi-depth bidirectional flow type shelf and layout storing and fetching method thereof

An access method and multi-depth technology, applied in storage devices, transportation, and packaging, can solve the problems of high cost of blocking unit loads and low access efficiency of one-way shelves, and achieve cost reduction and high space utilization. Effect

Inactive Publication Date: 2014-04-16
SOUTHEAST UNIV
View PDF6 Cites 20 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0015] Purpose of the invention: a multi-depth two-way flow shelf and its layout access method, which are used to solve the problems of low access efficiency of one-way shelves and high cost of handling blocking unit loads

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Multi-depth bidirectional flow type shelf and layout storing and fetching method thereof
  • Multi-depth bidirectional flow type shelf and layout storing and fetching method thereof
  • Multi-depth bidirectional flow type shelf and layout storing and fetching method thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0031] Below in conjunction with specific embodiment, further illustrate the present invention, should be understood that these embodiments are only used to illustrate the present invention and are not intended to limit the scope of the present invention, after having read the present invention, those skilled in the art will understand various equivalent forms of the present invention All modifications fall within the scope defined by the appended claims of the present application.

[0032] Such as Figure 2-3As shown, the multi-depth two-way flow rack, in the embodiment of the unit load warehouse using the rack, a multi-depth two-way flow rack includes working surface A and working surface B, and a stacker is arranged on each surface. The shelves consist of 6 columns and 4 rows of storage units. The inclination directions of two adjacent columns of memory cells are opposite. Among them, in the odd-numbered column (column 1, 3, 5) storage units, the unit load slides from the...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention discloses a multi-depth bidirectional flow type shelf and a layout storing and fetching method thereof. The shelf comprises two working faces, the side of each working face is provided with a stacking machine used for storing and fetching a unit load. The shelf is provided with multi-depth storing units, and space utilizing rate can be increased by decreasing the working roadway number. Storing units of the shelf are organized in columns, inclining direction of two adjacent columns of the storing units are opposite, that is to say, in one working face, one unit load is stored in a half storing unit column, and is fetched from the other half storing unit column. Thus, the stacking machines can execute storing and fetching the unit loads in a dual-command mode, namely storing one unit load and fetching another unit load in one execution, so that storing and fetching efficiency is improved; the unit load features first in and first out, a target unit load may be blocked by other unit loads during fetching, and the blocking unit loads can be transferred to the storing units on the same working face.

Description

[0001] technical field [0002] The invention relates to a multi-depth two-way flow shelf and a layout access method thereof, which is suitable for a unit load warehouse in a logistics network distribution center, and is especially suitable for a multi-depth flow shelf-type three-dimensional storage system. Background technique [0003] In the unit load warehouse, the unit load is organized into unit load access (the goods are placed on pallets, and a pallet and the goods carried are regarded as a unit load, which is stored and withdrawn as a basic operation unit of the unit load), so as to improve the storage capacity of the warehouse. access efficiency. In the existing multi-depth flow rack unit load warehouse, the multi-depth one-way flow rack with higher space utilization [1] , as attached figure 1 Shown, as a unit load storage device. Flowing multi-depth racks contain multiple levels and columns of sloped storage units. The bottom surface of the storage unit is prov...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): B65G1/137B65G1/04
Inventor 李小平陈竹西朱夏郭宇澄
Owner SOUTHEAST UNIV
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com