Device and method for realizing small-angle X-ray diffraction function
An X-ray and functional technology, applied in the field of small-angle X-ray diffraction devices, can solve problems such as difficult debugging, high requirements for instrument assembly and operation skills, and difficulty in obtaining SAXRD spectra, achieving high cost performance and low cost , the effect of simple operation
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[0022] A silicon dioxide film with different thicknesses was grown on a silicon wafer by dry oxygen oxidation process. attached figure 2 The small-angle X-ray diffraction curves collected by the ordinary X-ray diffractometer using the device and method proposed in this patent are given. Intensity oscillations due to interference effects can be clearly observed from the figure. from the formula It can be calculated that the thickness of the silicon dioxide layer in the sample is 3.5 nm, respectively. It can be seen that the lifting device and method of the sample stage proposed by us can fully realize the SAXRD function on an ordinary XRD spectrometer.
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