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A Method for Reducing Verification Misreporting Errors After OPC Correction

A false alarm and error technology, applied in the field of microelectronic optical proximity correction, can solve problems such as false alarms, improve efficiency and reduce verification false alarms.

Active Publication Date: 2017-11-03
SHANGHAI HUALI MICROELECTRONICS CORP
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Problems solved by technology

[0009] The purpose of the present invention is to provide a method for reducing false positives in verification after OPC correction, so as to solve the problem of the difference between the simulation size and the target size due to the influence of optical proximity effects such as graphic rounding in the existing OPC correction simulation inspection verification. There will be a problem of false positives when there is a relative deviation

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  • A Method for Reducing Verification Misreporting Errors After OPC Correction
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  • A Method for Reducing Verification Misreporting Errors After OPC Correction

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Embodiment Construction

[0034] The present invention will be further described below in conjunction with the accompanying drawings and specific embodiments, but not as a limitation of the present invention.

[0035]In the current relative size ratio inspection of simulation verification after OPC correction, in order to avoid the influence of rounded corners of graphics, a filter area or filter line segment is generally formed, and the graphics or line ends in the filter area will not report errors in simulation inspection, so that It avoids a large number of false positives, see figure 1 shown; however, when the corners are rounded severely, errors and false positives will occur, see figure 2 shown.

[0036] In order to reduce the problem of simulation verification errors and false positives, the following methods are used to check the relative size ratio of simulation verification:

[0037] 1. First select the graphics area that may cause false positives in OPC verification. This area is charac...

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Abstract

The invention discloses a verification method for reducing false reporting after OPC (Optical Proximity Correction). The method comprises the following steps: step 1, finishing OPC, and after the OPC is finished, generating a pattern after the OPC and a target pattern before the OPC; step 2, after the OPC is finished, selecting a pattern region which causes false reporting in OPC verification; step 3, intercepting a pattern edge segment in the pattern region causing false reporting; step 4, forming an independent OPC verification region along the pattern edge segment; and step 5, carrying out OPC verification. With the adoption of the verification method for reducing the false reporting after the OPC disclosed by the invention, false reporting in the OPC verification can be effectively reduced and the real OPC error omission is avoided, so that the efficiency of checking an OPC verification result is improved.

Description

technical field [0001] The present invention relates to the technical field of microelectronics optical proximity correction, in particular to a method for reducing verification error reporting after optical proximity correction (Optical Proximity Correction, OPC for short) correction. Background technique [0002] In the semiconductor manufacturing process, as the feature size continues to decrease and the pattern complexity becomes higher and higher, OPC technology is also continuously developed to adapt to the continuous problems in the pattern imaging process. The most widely used OPC method at present is the OPC correction method based on the model. Its basic principle is to simulate the original layout or the target layout by establishing an exposure model based on specific lithography conditions to obtain the simulation error, and then the original layout according to a certain Carry out segmented cutting according to the rules, perform offset compensation and re-simu...

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G03F1/36
Inventor 何大权张辰明魏芳张旭昇
Owner SHANGHAI HUALI MICROELECTRONICS CORP
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