Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

amoled metal mask

A mask and slit technology, which is applied in the field of organic light-emitting display, can solve the problems of narrow side width and other problems, and achieve the effect of shortening the distance, good effect, and narrowing the frame

Active Publication Date: 2016-04-27
SHANGHAI TIANMA MICRO ELECTRONICS CO LTD
View PDF5 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0007] The present invention proposes a mask plate structure that can solve the above technical problems, and can solve the problem of narrow side width

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • amoled metal mask
  • amoled metal mask
  • amoled metal mask

Examples

Experimental program
Comparison scheme
Effect test

no. 1 example

[0038] This embodiment provides a mask plate for AMOLED evaporation, please refer to image 3 , image 3 It is a schematic diagram of the mask plate according to the first embodiment of the present invention, and the mask plate includes:

[0039] Bottom member 200, and a first area and a second area located on the bottom member 200, the first area corresponds to the display area of ​​AMOLED, the second area corresponds to the transition area of ​​AMOLED, and the second area is set at the second Left and right sides of a zone;

[0040] A plurality of left and right parallel slits 201 provided on the bottom member 200 and penetrating the bottom member 200 are provided in the first region, wherein the plurality of slits 201 have a predetermined length and extend in a vertical direction, the The slit 201 is used for vapor deposition of color pixels in the AMOLED display area;

[0041] Four rows of rectangular small holes 202 are arranged in the second area, and rib support memb...

no. 2 example

[0053] The second embodiment of the present invention has been optimized on the basis of the first embodiment. For details, please refer to Figure 4 , Figure 4 It is a schematic diagram of the mask plate of the second embodiment of the present invention. Compared with the first embodiment, the second embodiment is better than the first embodiment in that: a region 304 of a cathode via hole is provided in the second region 302 .

[0054] The area 304 where the cathode via hole is provided at least partly coincides with the area corresponding to the second area 302 , specifically, coincides with the area of ​​the rib support part 303 , and is between the upper and lower small holes 302 of the corresponding rib support part 303 .

[0055] Compared with the scheme in the prior art, where the area of ​​the cathode via hole must be set in the area other than the slit in the second area, in this embodiment, the area for setting the cathode via hole is set between two adjacent small...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
widthaaaaaaaaaa
sizeaaaaaaaaaa
thicknessaaaaaaaaaa
Login to View More

Abstract

The invention discloses a mask plate for evaporation. The mask plate is characterized by including a first region and second regions. Specifically, the first region corresponds to a display area, the second region corresponds to transition areas, and the second regions are arranged on the left side and right side of the first region. The first region is equipped with a plurality of horizontally parallel slits, the second regions are provided with at least one row of holes, and rib support members are disposed between the adjacent holes in each row of holes. The mask plate for evaporation provided by the invention has better tension transition and balance effects, and the risk of edge color mixing occurring during evaporation in the display area can be reduced. In addition, compared with the prior art, the mask plate occupies less space and realizes frame narrowing in space. The design can also reduce the manufacturing difficulty of the mask plate and lower the cost of the mask plate.

Description

technical field [0001] The invention relates to the field of organic light-emitting displays, and more particularly, to a metal mask used for manufacturing organic light-emitting displays. Background technique [0002] AMOLED (ActiveMatrixOrganicLightEmittingDisplay, active matrix organic light emitting display device) has the characteristics of low self-luminous power consumption, fast response speed, high contrast ratio, and wide viewing angle. [0003] In the process of manufacturing AMOLED, the pixel R (red) G (green) B (blue) needs to be evaporated separately, and the non-evaporation area needs to be blocked by a mask plate during the evaporation process. In the prior art, such as figure 1 , the mask plate is generally provided with a first area 101 corresponding to the AMOLED display area and a second area 102 corresponding to the AMOLED transition area on the substrate 100, and a slit is provided in the first area 101, and the slit in the first area 101 is for evapo...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Patents(China)
IPC IPC(8): C23C14/04C23C14/24H01L51/56
Inventor 毕德锋叶添昇向传义
Owner SHANGHAI TIANMA MICRO ELECTRONICS CO LTD
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com