Femtosecond laser mode adjustable optical tweezers control device based on column vector light beam
A femtosecond laser and manipulation device technology, applied in optics, optical components, microscopes, etc., can solve problems such as thermal damage, achieve damage-free manipulation, improve capturing power, and avoid thermal damage.
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specific Embodiment approach 1
[0019] Specific implementation mode 1. Combination figure 1 Describe this specific embodiment. The difference between the femtosecond laser mode adjustable optical tweezers control device based on the cylindrical vector beam described in this specific embodiment is that it includes a femtosecond pulsed laser 1, an aperture 2, an attenuation plate 3, The first 800nm total reflection mirror 4, the first beam splitter 5, the polarization converter 6, the second beam splitter 7, the second 800nm total reflection mirror 8, the third 800nm total reflection mirror 9, the shutter 10, the fourth 800nm total reflection mirror mirror 11, microscope 12 and stage 13,
[0020] The pulsed laser light emitted by the femtosecond pulse laser 1 enters the attenuation plate 3 through the diaphragm 2, and the attenuation plate 3 attenuates the light intensity of the pulsed laser light, and then the pulsed laser light is incident on the first 800nm total reflection mirror 4, and the first...
specific Embodiment approach 2
[0027] Embodiment 2. The difference between this embodiment and the femtosecond laser mode tunable optical tweezers control device based on cylindrical vector beam described in Embodiment 1 is that the femtosecond pulsed laser 1 is titanium-doped sapphire femto second laser with an output pulse repetition rate of 76 MHz and a pulse width of 120 femtoseconds.
specific Embodiment approach 3
[0028] Embodiment 3. The difference between this embodiment and the femtosecond laser mode tunable optical tweezers control device based on columnar vector beams described in Embodiment 1 is that the stage 13 is a three-dimensional micro-displacement platform.
[0029] The control accuracy of the three-dimensional linear excitation source of the stage 13 in this embodiment is 50 nm.
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