A coating device and its pre-ejection control method

Abstract

The embodiment of the invention provides a coating device and a pre-discharging control method, and relates to the technical field of coating on displays. The coating stability and the uniformity in the initial coating period can be improved, and disqualified coating is reduced. The coating device comprises a glue supply device, and a pressurization pump connected with the glue supply device, wherein the pressurization pump is connected with an output pipeline; the output pipeline comprises a first output branch and a second output branch; the first output branch is connected with the pressurization pump and a coating sprayer; a coating valve and a coating pressure gauge are arranged on the first output branch; a pre-discharging valve, a pre-discharging pressure gauge and a pre-discharging pressure adjustment valve are arranged on the second output branch. The method is used for preparation of the coating device.

Description

technical field [0001] The invention relates to the technical field of coating of display devices, in particular to a coating device and a pre-ejection control method thereof. Background technique [0002] At present, in the photolithographic patterning process of display device manufacturing, the process of coating photoresist, exposing and developing on the surface of the substrate is often involved. Such as figure 1 As shown, the structure of the coating device 01 is mainly composed of a glue supply device 10 , a pressure pump 20 , and a coating nozzle 40 connected to the pressure pump 20 through an output pipeline 30 . [0003] Such as figure 2 As shown, the basic process of using a coating device to coat the surface of the object to be coated in the prior art is: the coating nozzle 40 moves from one end of the substrate 60 to the other end (direction of the arrow in the figure) driven by the driving device. That is, it indicates the coating direction), and at the sa...

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Problems solved by technology

[0005] Because in the initial stage of the substrate, the coating nozzle needs to be gradually accelerated by the driving device until it reaches a stable constant speed state (marked as speed ν 1 ), while at the same time, the speed of the colloid ejected by the pressurized pump connected to the coating nozzle is accelerated to a stable constant speed state (marked as speed ν 2 ), so that the photoresist is spit out in accordance with the moving speed of the coating nozzle, so that the photoresist layer coated on the substrate surface has a uniform thickness; The speed is quite fast, so that in the initial stage of high-speed coating (such as figure 2 As shown in the dotted line in the middle), it is difficult for the spraying speed of the pressurized pump to perfectly match the moving speed of the coating nozzle, and it is difficult to ensure the coating stability and film thickness uniformity at the initial stage, resulting in the overall photoresist on the substrate. The uniformity of the film thickness is reduced, which affects the display quality

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