Supercharge Your Innovation With Domain-Expert AI Agents!

Nanostructured stamp, embossing roller, and device and method for the continuous embossing of nanostructures

A technology of nanostructures and embossing rollers, which is applied to the nanostructured punches used for embossing embossing rollers, a kind of basis field, which can solve problems such as rising technical problems, and achieve the effect of simplifying operation

Active Publication Date: 2014-07-30
EV GRP E THALLNER GMBH
View PDF4 Cites 2 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

It is easy to imagine that technical problems increase more than average in the endless application of ever smaller embossed structures

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Nanostructured stamp, embossing roller, and device and method for the continuous embossing of nanostructures
  • Nanostructured stamp, embossing roller, and device and method for the continuous embossing of nanostructures
  • Nanostructured stamp, embossing roller, and device and method for the continuous embossing of nanostructures

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0045] In the drawings, the features according to the invention are not shown to scale, in order to fully illustrate the function of the individual features. The proportions of the individual components are also partly not to scale, which can be traced in particular to the nanostructures 14 shown in a greatly enlarged manner. Nanostructures 14 , which are imprinted with the present invention or used to imprint corresponding nanostructures onto workpieces, are in the nanometer and / or micrometer range, whereas the order of magnitude of the machine components is in the centimeter range.

[0046] In FIG. 1 , a vacuum chamber 2 is shown schematically, which surrounds a working chamber 6 which can be subjected to a vacuum. The vacuum chamber 2 can be loaded via a not shown, sealed door or lock.

[0047] In the working chamber 6 , an embossing roller receptacle 4 is arranged on the bottom 2 b of the vacuum chamber 2 for receiving and controllably pivoting a rotary body 5 . The roto...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention relates to a nanostructured stamp with a concavely curved nanostructured stamping surface (7f) for seamlessly embossing at least one circumferential ring of a lateral surface of an embossing roller in a step-and-repeat method and to an embossing roller for the continuous embossing of nanostructures, said embossing roller comprising an embossing layer (13) which is applied onto a rotating body (5) and which comprises a lateral surface (13o) with at least one circumferential ring (15) that is formed in a seamless manner at least in the circumferential direction and is embossed in the step-and-repeat method. The invention further relates to a method and a device for producing such an embossing roller (16) for the continuous embossing of nanostructures, to a method for producing such a nanostructured stamp (1), and to a method for producing an embossed substrate (18).

Description

technical field [0001] The invention relates to a nanostructure punch (Nanostrukturstempel) for embossing an embossing roller (Prögerolle) according to claim 1, a nanostructure for endless embossing (Endlosprögen) according to claim 4 An embossing roller, a device for manufacturing an embossing roller for endless embossing nanostructures according to claim 7, a nanostructure punch for manufacturing an embossing roller according to claim 11 and a method for manufacturing an embossing roll for endlessly imprinting nanostructures according to claim 14 . Furthermore, the invention relates to a method according to claim 18 for producing an embossed substrate with nanostructures. Background technique [0002] In the development of mass production technology for nanostructured surfaces and semiconductor structures (e.g. thin films) for large-area applications there is a need for a functioning roll-to-roll machine (Rolle-zu-Rolle-Maschine) capable of Continuous nanostructured and / ...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/00B29C59/04
CPCB29C59/04G03F7/0002B29C35/0888B29C59/021B29C2035/0827B29C2059/023B82Y10/00B82Y40/00B29C59/043B29C59/002
Inventor G.克赖因德尔M.温普林格T.格林斯纳
Owner EV GRP E THALLNER GMBH
Features
  • R&D
  • Intellectual Property
  • Life Sciences
  • Materials
  • Tech Scout
Why Patsnap Eureka
  • Unparalleled Data Quality
  • Higher Quality Content
  • 60% Fewer Hallucinations
Social media
Patsnap Eureka Blog
Learn More

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2025 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com