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Array substrate preparation method, array substrate and display device

An array substrate and graphics technology, applied in semiconductor/solid-state device manufacturing, electrical components, electrical solid-state devices, etc., can solve problems such as low efficiency, high production cost, and greater impact on production capacity, and achieve simplified manufacturing processes, increased production capacity, The effect of reducing production costs

Inactive Publication Date: 2014-09-10
BOE TECH GRP CO LTD +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0013] It can be seen that in the preparation process of the existing ADS-type array substrate, eight patterning processes are generally required to complete the preparation of the array substrate, which has low efficiency and high production cost, and has a great impact on production capacity.

Method used

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  • Array substrate preparation method, array substrate and display device
  • Array substrate preparation method, array substrate and display device
  • Array substrate preparation method, array substrate and display device

Examples

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Embodiment 1

[0052] A preparation method for an array substrate, comprising the step of forming a thin film transistor, a pixel electrode, a common electrode line, and a gate line and a data line electrically connected to the thin film transistor, and forming the thin film transistor includes forming a gate electrode, a gate insulating layer, a semiconductor layer 1. A step of etching the pattern of the barrier layer, the source electrode and the drain electrode, the gate electrode and the common electrode line are formed on the same layer. In the preparation method of the array substrate of this embodiment, the gate insulating film and the semiconductor film are sequentially formed, and a pattern including the semiconductor layer is formed through a patterning process; The pattern of the etch barrier layer.

[0053] Wherein, forming a pattern comprising a gate insulating layer and an etching barrier layer through a patterning process includes: forming a pattern comprising a gate insulatin...

Embodiment 2

[0071] This embodiment provides a method for preparing an array substrate, including the steps of forming a thin film transistor, a pixel electrode, a common electrode line, and a gate line and a data line electrically connected to the thin film transistor. Layer, semiconductor layer, etch stop layer, patterning of source and drain, gate and common electrode lines are formed in the same layer. In the manufacturing method of the array substrate of this embodiment, the semiconductor thin film and the etch stop film are sequentially formed, and a pattern including the semiconductor layer and the etch stop layer is formed through one patterning process.

[0072] Wherein, forming the pattern including the semiconductor layer and the etching barrier layer through one patterning process includes: forming the pattern including the semiconductor layer and the etching barrier layer with the same projected area through one patterning process.

[0073] Specifically, before sequentially fo...

Embodiment 3

[0096] This embodiment provides a method for preparing an array substrate, including the steps of forming a thin film transistor, a pixel electrode, a common electrode line, and a gate line and a data line electrically connected to the thin film transistor. Layer, semiconductor layer, etch stop layer, patterning of source and drain, gate and common electrode lines are formed in the same layer. In the manufacturing method of the array substrate of this embodiment, the etching stopper film and the transparent electrode film are sequentially formed, and a pattern including the etch stopper layer and the pixel electrode is formed through one patterning process.

[0097] Wherein, forming a pattern comprising an etching barrier layer and a pixel electrode through a patterning process includes: forming a pattern comprising an etching barrier layer and a pixel electrode having the same projected area through a patterning process, and forming a pattern comprising an etching barrier laye...

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Abstract

The invention belongs to the display technical field and relates to an array substrate preparation method, an array substrate and a display device. The array substrate preparation method includes steps for forming a thin film transistor, a pixel electrode and a common electrode line. Steps for forming the thin film transistor include steps for forming patterns of a gate, a gate insulating layer, a semiconductor layer, an etching stopping layer, a source and a drain, the gate and the common electrode line being formed in the same layer. The array substrate preparation method is characterized in that: a gate insulating thin film and a semiconductor thin film are formed sequentially, and a pattern containing the semiconductor layer is formed through one-step patterning process; and an etching stopping thin film is formed, and a pattern containing the gate insulating layer and the etching stopping layer is formed through one-step patterning process. With the array substrate preparation method of the invention adopted, the number of times of patterning process can be decreased, and production process can be simplified, and the manufacturing capacity of array substrate products can be improved, and production efficiency can be improved, and production cost can be reduced.

Description

technical field [0001] The invention belongs to the field of display technology, and in particular relates to a method for preparing an array substrate, an array substrate and a display device. Background technique [0002] With the development of science and technology, flat panel display devices have replaced bulky CRT display devices and are increasingly embedded in people's daily life. Currently, commonly used flat panel display devices include LCD (Liquid Crystal Display: Liquid Crystal Display) and OLED (Organic Light-Emitting Diode: Organic Light-Emitting Diode) display devices. [0003] Regardless of whether it is an LCD or an OLED display device, it includes an array substrate. The array substrate includes a plurality of pixel circuits composed of thin film transistors (Thin Film Transistor: TFT for short) arranged in an array. Each pixel circuit corresponds to a sub-pixel unit. Transistors are used as control switches of pixels in a display device, and are directl...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01L21/77H01L27/12
CPCH01L27/1214H01L27/124H01L27/1225H01L27/1288H01L21/02565H01L21/467H01L21/475H01L21/47573H01L27/1259H01L29/24H01L29/66969H01L29/7869
Inventor 郭建
Owner BOE TECH GRP CO LTD
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