Sintering apparatus
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- SHIN ETSU CHEM CO LTD
- Publication Date
- 2014-10-15
- Estimated Expiration
- Not applicable · inactive patent
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Abstract
Description
technical field
[0001] This invention relates to the manufacture of high purity synthetic silica glass for use in optical fibers and the like. Background technique
[0002] As a method for producing synthetic quartz glass, Japanese Patent Application Laid-Open No. 2012-250887 describes the method of heating and sintering a soot deposited body produced by depositing fine silica powder produced by reacting a silicon compound in a sintering furnace. method. A VAD method, an OVD method, etc. are known as the manufacturing method of a soot deposit. The structure of the sintering furnace includes, for example, a heating furnace and a core tube, and a gas suitable for the sintering atmosphere is introduced or discharged into the core tube. The above-mentioned soot-deposited body is introduced into the furnace tube and heated in an appropriate atmosphere to become a transparent glass body. In order to maintain the atmosphere during sintering in an appropriate state, the furnace c...