An etching machine and a method for cleaning crystals of the etching machine

Abstract

The invention provides an etching machine and a method for cleaning crystals of the etching machine. The etching machine comprises an etching chamber which comprises an entrance and an exit; a liquid medicine tank which is located in the etching chamber and which contains liquid medicine; and a concentration controller which comprises a water-replenishing pipeline. A substrate is entered from the entrance of the etching chamber and is transported to the exit of the etching chamber; the substrate makes contact with liquid medicine in the liquid medicine tank in the etching chamber during the transport process; and the water-replenishing pipeline can inject water to the liquid medicine tank through the exit, and the water from the water-replenishing pipeline can adjust the concentration of the liquid medicine in the liquid medicine tank, and can clean the liquid medicine crystals at the exit. According to the etching machine and the method for cleaning the crystals of the etching machine, the easy-to-crystallize place, such as the exit, where an air curtain is formed, of the etching machine can be cleaned at the same time the water is added, thereby increasing the cleaning time and frequency of the easy-to-crystallize place, reducing the generation probability of the crystals effectively, and improving the qualified rate of the products.

Description

technical field [0001] The invention relates to an etching machine, in particular to an etching machine which has a cleaning function and can remove crystals. Background technique [0002] Existing etching machines such as figure 1 As shown, it includes an etching chamber 1 , a liquid medicine tank 2 located in the etching chamber 1 , a drainage pipeline 3 , a water supply pipeline 4 and a compressed air pipeline 5 . The liquid medicine tank 2 holds the liquid medicine for processing the substrate 10, and the liquid medicine tank 2 is provided with a conveying device 6 for transporting the substrate 10. liquid contact. Finally, the substrate 10 is conveyed to the exit of the etching chamber 1 by the conveying device 6 , and then leaves to enter the next process. Among them, one end of the replenishment pipeline 4 is connected to the concentration controller (not shown), and the other end is communicated with the drainage pipeline 3. When the valve 7 is opened, the water f...

AI Technical Summary

Problems solved by technology

[0003] The existing etching machine has the problem of liquid crystallization: especially at the exit of etching chamber 1, that is, the gas curtain A, the pro

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