Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Grating shear wave aberration detection interferometer and its detection method

A shear wave and interferometer technology, applied in the field of grating shear wave aberration detection interferometer, can solve the problems of eliminating system error, increasing human error, geometric optical path error and large detector tilt error

Active Publication Date: 2016-09-21
SHANGHAI INST OF OPTICS & FINE MECHANICS CHINESE ACAD OF SCI
View PDF7 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Although the above method can improve the detection accuracy of wave aberration to a certain extent, it is necessary to use auxiliary means to eliminate the detector tilt error, or to perform theoretical calculations based on pre-measured corresponding data, and subtract the theoretical system from the experimental data. The system error has not been eliminated according to the actual experimental conditions, the residual geometric optical path error and the detector tilt error are relatively large, or multiple measurements are required, which increases human error, etc.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Grating shear wave aberration detection interferometer and its detection method
  • Grating shear wave aberration detection interferometer and its detection method
  • Grating shear wave aberration detection interferometer and its detection method

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0106] The present invention will be further described below in conjunction with the examples and drawings, but the examples should not limit the protection scope of the present invention.

[0107] see first figure 1 , figure 1 It is the optical path diagram of the grating shear wave aberration detection interferometer of the present invention. It can be seen from the figure that the grating shear wave aberration detection interferometer of the present invention includes a light source 1, along which the light beam propagation direction of the light source 1 is successively a focusing mirror 2, a small filter Hole 3, two-dimensional grating 5, grating displacement stage 6, aperture plate 7, aperture alignment displacement stage 8 and two-dimensional photoelectric sensor 9; described two-dimensional grating 5 is placed on grating displacement stage 6, and described The aperture plate 7 is placed on the aperture alignment displacement stage 8; the optical system 4 to be measure...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention provides a grating shear wave aberration detection interferometer. The grating shear wave aberration detection interferometer comprises a light source, a focus lens, a filtering pinhole, a two-dimensional grating, a grating displacement platform, a diaphragm plate, a diaphragm alignment displacement platform and a two-dimensional photoelectric sensor. According to the grating shear wave aberration detection interferometer, the wave aberration of an optical system to be detected is detected; when the optical system to be detected is illuminated by the light source, the wavefront of the optical system to be detected generates an interference pattern through grating separation and shear, wavefront reconstruction is conducted on differential information generated by multiple diffraction levels in different directions through shear and interference, so that a system error correlative is obtained, and then the relevant parameters, namely, the distance between every two adjacent focusing points of different levels of diffraction light and the inclination angle of a detector, of main system error terms influencing the wave aberration detection precision of the grating shear interferometer are obtained; in this way, geometric path-length errors and detector inclination errors existing in wave aberration detection are eliminated, and the precision of wavefront reconstruction and the accuracy of wave aberration detection are improved. By the adoption of the grating shear wave aberration detection interferometer, wave aberration detection of the optical system to be detected is conducted, system errors existing during detection are eliminated, and the detection precision is improved.

Description

technical field [0001] The invention relates to a grating shear interferometer, in particular to a grating shear wave aberration detection interferometer and a detection method thereof. Background technique [0002] Grating shearing interferometer is an important form of wavefront sensor, which has the advantages of simple structure, no need for a separate reference wavefront, easy to achieve common optical path interference, and anti-environmental interference. There are systematic errors such as geometric optical path error, grating diffraction error, grating position offset and detector tilt in the grating shearing interferometer, which affect the detection accuracy of wave aberration; especially for the application of wave aberration detection in high-precision optical systems, to be The optical system under test has a certain numerical aperture (NA), and the alignment difficulty and system error of the system increase with the numerical aperture. System error is the pr...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Patents(China)
IPC IPC(8): G01M11/02
Inventor 李杰唐锋王向朝戴凤钊吴飞斌李永
Owner SHANGHAI INST OF OPTICS & FINE MECHANICS CHINESE ACAD OF SCI
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products